Imaging studies of strained InGaAsP/InP heterostructures by photoluminescence microscopy

A. Bernussi, W. Carvalho, M. Furtado, A. Gobbi, M. Cotta
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引用次数: 0

Abstract

Strained In/sub 1-x/Ga/sub x/As/sub y/P/sub 1-y//InP single quantum wells grown by low-pressure metal-organic vapor phase epitaxy were investigated by photoluminescence microscopy imaging (PLM), photoluminescence spectroscopy, X-ray diffraction and atomic force microscopy techniques. PLM images of strained structures revealed the presence of a large number of non-radiative centers (dark spots). The dark spot density was dependent on tensile strain magnitude, barrier material and cap layer thickness. PLM images of highly tensile and compressive strained quaternary layers grown with the same structure exhibited quite different relaxation mechanisms.
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应变InGaAsP/InP异质结构的光致发光显微镜成像研究
采用光致发光显微镜成像(PLM)、光致发光光谱、x射线衍射和原子力显微镜技术研究了低压金属-有机气相外延生长的应变In/sub 1-x/Ga/sub x/As/sub y/P/sub 1-y/ InP单量子阱。应变结构的PLM图像显示存在大量非辐射中心(黑点)。暗斑密度与拉伸应变大小、阻挡材料和帽层厚度有关。在相同结构下生长的高拉伸和高压缩应变第四系层的PLM图像显示出截然不同的松弛机制。
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