Cathodoluminescence Studies of Quantum Dots Etched from Single Quantum Well GaAs/AlGaAs

E. Clausen, H. Craighead, J. Harbison, L. M. Schiavone, B. P. Van der Gaag, L. Florez
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Abstract

High resolution electron beam lithography combined with reactive ion etching has enabled the creation of GaAs structures a few tens of nanometers in lateral dimension.1 There have been several studies of luminescence from GaAs "quantum dot and wire" structures. However, reports differ as to the luminescence efficiency, peak shifts and spectral character. Photoluminescence studies of structures etched from GaAs/AlGaAs quantum well material have shown that nonradiative surface recombination typically results in no observable luminescence for quantum dots smaller than ~ 60 nm.2,3 Multiple quantum well wires have been fabricated with dimensions as small as 20 nm in cross section which still luminesce with an efficiency not degraded by the fabrication process.4 Photoluminescence measurements have indicated a spatial quantization in dots as large as 250 nm.5 Other photoluminescence measurements of various size dots show no decrease in luminescence efficiency,2 compared to unpatterned material and different spectral structure attributed to quantization effects for diameters around 60 nm.6 In contrast, Forchel et al. monitored the GaAs free exciton emission from a 4 nm thick quantum well etched into wires and observed a marked decrease in luminescence intensity with decreasing wire width.7
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单量子阱GaAs/AlGaAs蚀刻量子点的阴极发光研究
高分辨率电子束光刻技术结合反应离子蚀刻技术,可以制造出横向尺寸为几十纳米的砷化镓结构已经有一些关于砷化镓“量子点和线”结构发光的研究。然而,在发光效率、峰移和光谱特性方面,报道有所不同。对GaAs/AlGaAs量子阱材料蚀刻结构的光致发光研究表明,对于小于~ 60 nm的量子点,非辐射表面复合通常不会产生可观察到的发光。2、3多个量子阱线已经被制造出来,其横截面尺寸小到20纳米,并且发光效率不会因制造过程而降低光致发光测量表明,在大至250纳米的点上存在空间量子化其他不同尺寸点的光致发光测量结果显示,与没有图案的材料和不同的光谱结构相比,发光效率没有下降,这归因于直径在60 nm左右的量化效应相比之下,Forchel等人监测了蚀刻在导线上的4 nm厚量子阱的GaAs自由激子发射,并观察到发光强度随着导线宽度的减小而显著降低
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