Multivariable control of multi-zone chemical mechanical polishing

Sheng-Jyh Shiul, Cheng-Ching Yu, S. Shen, A. Sul
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引用次数: 1

Abstract

The modeling and multivariable control of the multi-zone CMP are studied in this work. In the process control notation, the manipulated variables are the three pressures applied to each zone. Therefore, this is a 60/spl times/3 non-square multivariable control problem. The singular value decomposition (SVD) is used to design a non-square feedback controller. The proposed control system is test on incoming wafers with different surface profiles. Results show that achievable performance can be maintained using the proposed SVD controller.
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多区域化学机械抛光的多变量控制
本文主要研究了多区CMP的建模和多变量控制问题。在过程控制符号中,被操纵的变量是应用于每个区域的三个压力。因此,这是一个60/spl乘以/3的非平方多变量控制问题。采用奇异值分解(SVD)方法设计非平方反馈控制器。对不同表面形貌的进料晶圆进行了测试。结果表明,所提出的奇异值分解控制器可以保持可实现的性能。
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