Leakage Current Degradation in SiC Junction Barrier Schottky Diodes under Heavy Ion Microbeam

Shu-rui Cao, Qingkui Yu, Guanghua Du, Jinlong Guo, Wang He, Hongwei Zhang, Sun Yi
{"title":"Leakage Current Degradation in SiC Junction Barrier Schottky Diodes under Heavy Ion Microbeam","authors":"Shu-rui Cao, Qingkui Yu, Guanghua Du, Jinlong Guo, Wang He, Hongwei Zhang, Sun Yi","doi":"10.1109/IPFA47161.2019.8984872","DOIUrl":null,"url":null,"abstract":"Leakage current degradation of SiC junction barrier Schottky diodes were studied under heavy ion microbeam. Leakage current increased linearly with fluence and was positively related to bias voltage. It was proposed that leakage current occurred as a result of the accumulation of multiple leakage paths. The explanation that the increased leakage current was related to leakage paths formed by damage in the mechanism of \"micro-SEB\" was verified.","PeriodicalId":169775,"journal":{"name":"2019 IEEE 26th International Symposium on Physical and Failure Analysis of Integrated Circuits (IPFA)","volume":"40 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2019-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"13","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE 26th International Symposium on Physical and Failure Analysis of Integrated Circuits (IPFA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IPFA47161.2019.8984872","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 13

Abstract

Leakage current degradation of SiC junction barrier Schottky diodes were studied under heavy ion microbeam. Leakage current increased linearly with fluence and was positively related to bias voltage. It was proposed that leakage current occurred as a result of the accumulation of multiple leakage paths. The explanation that the increased leakage current was related to leakage paths formed by damage in the mechanism of "micro-SEB" was verified.
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