Piezoelectric thin film pressure sensor made by atomic layer deposition of 002-oriented ZnO on Si3N4 membrane

B. Hudec, G. Vanko, M. Precner, E. Dobročka, A. Seifertová, J. Fedor, J. Tóbik, K. Fröhlich
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Abstract

In this work, we present a pressure sensor based on piezoelectric response of a thin 100 nm ZnO 002-oriented film grown using atomic layer deposition (ALD) technique on a commercial Si3N4 membrane. In contacts on top of the ZnO film allowed measuring the piezoelectric response laterally along the ZnO film induced by the pressure difference causing mechanical deflection of the membrane. The ALD of ZnO is the key process here, where the growth characteristics were investigated in order to obtain 002-oriented piezoelectric ZnO films. A linear response of this sensor in the 0.2-1.0 kPa range was recorded.
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在Si3N4薄膜上原子层沉积002取向ZnO制成压电薄膜压力传感器
在这项工作中,我们提出了一种基于在商用Si3N4膜上使用原子层沉积(ALD)技术生长的100 nm ZnO 002取向薄膜的压电响应的压力传感器。在ZnO薄膜顶部的触点中,可以测量由压力差引起的薄膜机械挠曲引起的沿ZnO薄膜的横向压电响应。ZnO的ALD是本文的关键工艺,为了获得002取向的ZnO压电薄膜,研究了ZnO的生长特性。记录了该传感器在0.2-1.0 kPa范围内的线性响应。
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