A physics-based compact model of quantum-mechanical effects for thin cylindrical Si-Nanowire MOSFETs

B. Cousin, O. Rozeau, M. Jaud, J. Jomaah
{"title":"A physics-based compact model of quantum-mechanical effects for thin cylindrical Si-Nanowire MOSFETs","authors":"B. Cousin, O. Rozeau, M. Jaud, J. Jomaah","doi":"10.1109/VTSA.2009.5159313","DOIUrl":null,"url":null,"abstract":"Since we know that quantum-mechanical effects are predominant in surrounding-gate MOSFETs, a model should be developed. For the first time, this paper presents an analytic model of quantization for thin cylindrical Si-Nanowire MOSFETs by using a variational approach. The model is implemented into a surface potential like model. It is shown that results agree with the numerical simulations.","PeriodicalId":309622,"journal":{"name":"2009 International Symposium on VLSI Technology, Systems, and Applications","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2009-04-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2009 International Symposium on VLSI Technology, Systems, and Applications","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VTSA.2009.5159313","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

Since we know that quantum-mechanical effects are predominant in surrounding-gate MOSFETs, a model should be developed. For the first time, this paper presents an analytic model of quantization for thin cylindrical Si-Nanowire MOSFETs by using a variational approach. The model is implemented into a surface potential like model. It is shown that results agree with the numerical simulations.
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薄圆柱形硅纳米线mosfet量子力学效应的基于物理的紧凑模型
由于我们知道量子力学效应在环栅mosfet中占主导地位,因此应该建立一个模型。本文首次用变分方法建立了硅纳米线mosfet的量子化分析模型。将模型实现为类表面电位模型。计算结果与数值模拟结果吻合。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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