ESD challenges in advanced CMOS systems on chip

G. Langguth, C. Russ, W. Soldner, B. Stein, H. Gossner
{"title":"ESD challenges in advanced CMOS systems on chip","authors":"G. Langguth, C. Russ, W. Soldner, B. Stein, H. Gossner","doi":"10.1109/ICICDT.2010.5510296","DOIUrl":null,"url":null,"abstract":"State-of-the-art Systems on Chip (SoC) for mobile phone applications integrate on one single chip the digital baseband core with analog blocks like power management unit, RF transceiver and mixed-signal sub-circuits. Performance considerations in such complex SoC designs include the use of ESD sensitive circuit topologies, such as thin oxide devices directly connected to I/O pads or implemented within high voltage domains, which both create new ESD challenges in advanced CMOS technology nodes. Based on 65 nm CMOS SoCs, we summarize known ESD challenges and unveil hidden issues. While advanced CMOS technology nodes already present very delicate environments with an extremely narrow window for ESD design, CDM discharge currents reach 5 to 10 A due to increased chip area. Different ESD protection concepts for a low noise amplifier (LNA) are compared where the RF-input pin connects directly to a thin oxide gate. Very-fast TLP results are correlated to on-product CDM performance. A slow turn-on behavior under fast-transient ESD stress makes the ICs particularly sensitive. In mixed device design, thin oxide devices are used in high voltage domains for which these devices are natively not suited. Reliability is ensured by extensive precautions in circuit design such no critical voltage is exceeded. ESD results of typical mixed device topologies will be discussed by associated failure modes and a protection strategy will be developed.","PeriodicalId":187361,"journal":{"name":"2010 IEEE International Conference on Integrated Circuit Design and Technology","volume":"259 4","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 IEEE International Conference on Integrated Circuit Design and Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICICDT.2010.5510296","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

State-of-the-art Systems on Chip (SoC) for mobile phone applications integrate on one single chip the digital baseband core with analog blocks like power management unit, RF transceiver and mixed-signal sub-circuits. Performance considerations in such complex SoC designs include the use of ESD sensitive circuit topologies, such as thin oxide devices directly connected to I/O pads or implemented within high voltage domains, which both create new ESD challenges in advanced CMOS technology nodes. Based on 65 nm CMOS SoCs, we summarize known ESD challenges and unveil hidden issues. While advanced CMOS technology nodes already present very delicate environments with an extremely narrow window for ESD design, CDM discharge currents reach 5 to 10 A due to increased chip area. Different ESD protection concepts for a low noise amplifier (LNA) are compared where the RF-input pin connects directly to a thin oxide gate. Very-fast TLP results are correlated to on-product CDM performance. A slow turn-on behavior under fast-transient ESD stress makes the ICs particularly sensitive. In mixed device design, thin oxide devices are used in high voltage domains for which these devices are natively not suited. Reliability is ensured by extensive precautions in circuit design such no critical voltage is exceeded. ESD results of typical mixed device topologies will be discussed by associated failure modes and a protection strategy will be developed.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
先进CMOS片上系统的ESD挑战
用于移动电话应用的最先进的片上系统(SoC)将数字基带核心与电源管理单元、射频收发器和混合信号子电路等模拟模块集成在一个芯片上。在这种复杂的SoC设计中,性能考虑因素包括使用ESD敏感电路拓扑,例如直接连接到I/O焊盘或在高压域中实现的薄氧化物器件,这两者都为先进的CMOS技术节点带来了新的ESD挑战。基于65纳米CMOS soc,我们总结了已知的ESD挑战并揭示了隐藏的问题。虽然先进的CMOS技术节点已经为ESD设计提供了非常微妙的环境和极窄的窗口,但由于芯片面积的增加,CDM放电电流达到5至10 A。对低噪声放大器(LNA)的不同ESD保护概念进行了比较,其中rf输入引脚直接连接到薄氧化栅极。非常快的TLP结果与产品上的CDM性能相关。在快速瞬态ESD应力下的缓慢导通行为使集成电路特别敏感。在混合器件设计中,薄氧化物器件用于高电压域,而这些器件本身不适合。可靠性是通过在电路设计中广泛的预防措施来保证的,这样就不会超过临界电压。典型混合器件拓扑的ESD结果将通过相关的失效模式进行讨论,并制定保护策略。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Improvement of integrated dipole antenna performance using diamond for intra-chip wireless interconnection MAGALI: A Network-on-Chip based multi-core system-on-chip for MIMO 4G SDR A new method for performance control of a differential active inductor for low power 2.4GHz applications Power switch optimization and sizing in 65nm PD-SOI considering supply voltage noise Emerging screen technologies impact on application engine IC power
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1