Why tunneling FETs don't work, and how to fix it

S. Agarwal, E. Yablonovitch
{"title":"Why tunneling FETs don't work, and how to fix it","authors":"S. Agarwal, E. Yablonovitch","doi":"10.1109/E3S.2013.6705868","DOIUrl":null,"url":null,"abstract":"To date, TFET results have been unsatisfying. The best reported subthreshold swings have been measured at a current density of around a nA/um and get significantly worse as the current increases. In order to achieve a better performance, there are fundamental design issues that need to be engineered. We can understand these issues by analyzing the three types of devices shown in Fig 1. The voltage required to operate a TFET can be given by: V<sub>DD</sub> = V<sub>SS</sub> × Log(I<sub>on</sub> /I<sub>off</sub>)+ V<sub>OV</sub>. V<sub>SS</sub> is the subthreshold swing and V<sub>OV</sub> is the overdrive voltage needed to achieve the desired on-current after threshold. V<sub>OV</sub> will be determined by the device geometry as shown in Fig 2 [1]. Introducing quantum confinement in the direction of tunneling increases the conductance by 1-2 orders of magnitude at low voltage. V<sub>SS</sub> is given by the following model [2]: SS = 1/ η<sub>el</sub> × (1/S<sub>Barrier</sub> + η<sub>conf</sub>/S<sub>DOS</sub>)<sup>-1</sup> (1) η<sub>el</sub> is the electrostatic gate efficiency. η<sub>conf</sub> is the quantum confinement efficiency and comes from energy level shifts that occur when the quantum well shape changes with bias. S<sub>Barrier</sub> represents the steepness in mV/decade that comes from changing the thickness of the tunneling barrier. S<sub>DOS</sub> is the steepness of the joint density of states (DOS) and represents the rate at which the joint DOS fall off as the band edges are misaligned.","PeriodicalId":231837,"journal":{"name":"2013 Third Berkeley Symposium on Energy Efficient Electronic Systems (E3S)","volume":"69 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2013-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 Third Berkeley Symposium on Energy Efficient Electronic Systems (E3S)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/E3S.2013.6705868","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

To date, TFET results have been unsatisfying. The best reported subthreshold swings have been measured at a current density of around a nA/um and get significantly worse as the current increases. In order to achieve a better performance, there are fundamental design issues that need to be engineered. We can understand these issues by analyzing the three types of devices shown in Fig 1. The voltage required to operate a TFET can be given by: VDD = VSS × Log(Ion /Ioff)+ VOV. VSS is the subthreshold swing and VOV is the overdrive voltage needed to achieve the desired on-current after threshold. VOV will be determined by the device geometry as shown in Fig 2 [1]. Introducing quantum confinement in the direction of tunneling increases the conductance by 1-2 orders of magnitude at low voltage. VSS is given by the following model [2]: SS = 1/ ηel × (1/SBarrier + ηconf/SDOS)-1 (1) ηel is the electrostatic gate efficiency. ηconf is the quantum confinement efficiency and comes from energy level shifts that occur when the quantum well shape changes with bias. SBarrier represents the steepness in mV/decade that comes from changing the thickness of the tunneling barrier. SDOS is the steepness of the joint density of states (DOS) and represents the rate at which the joint DOS fall off as the band edges are misaligned.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
为什么隧道效应晶体管不工作,如何解决它
迄今为止,TFET的结果并不令人满意。最好的亚阈值波动是在电流密度约为1 nA/um时测量到的,并且随着电流的增加而变得明显更糟。为了获得更好的性能,需要设计一些基本的设计问题。我们可以通过分析图1所示的三种类型的设备来理解这些问题。工作TFET所需的电压可以由:VDD = VSS × Log(Ion /Ioff)+ VOV给出。VSS是亚阈值摆幅,VOV是达到阈值后所需导通电流所需的超速电压。VOV将由器件几何形状决定,如图2[1]所示。在低电压下,在隧穿方向上引入量子约束使电导率提高了1-2个数量级。VSS由以下模型给出[2]:SS = 1/ ηel × (1/SBarrier + ηconf/SDOS)-1 (1) ηel为静电栅极效率。ηconf是量子约束效率,来自于量子阱形状随偏置变化时发生的能级位移。SBarrier表示陡峭度,单位为mV/ 10年,它来自于隧道势垒厚度的改变。SDOS是关节状态密度(DOS)的陡度,表示当带边缘不对齐时关节状态密度下降的速率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Device design considerations for ultra-thin body non-hysteretic negative capacitance FETs Ultra-Low power neuromorphic computing with spin-torque devices Power-efficient server utilization in compute clouds Energy transparency from hardware to software Prospects for high-aspect-ratio FinFETs in low-power logic
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1