Bias stress stabilities of PMMA-passivated indium-gallium-zinc-oxide thin-film transistors after 100 °C steam exposure

IF 1.4 4区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Solid-state Electronics Pub Date : 2024-02-28 DOI:10.1016/j.sse.2024.108893
Yuyun Chen , Guodong Xu , Yunpeng Yu , Yi Shen
{"title":"Bias stress stabilities of PMMA-passivated indium-gallium-zinc-oxide thin-film transistors after 100 °C steam exposure","authors":"Yuyun Chen ,&nbsp;Guodong Xu ,&nbsp;Yunpeng Yu ,&nbsp;Yi Shen","doi":"10.1016/j.sse.2024.108893","DOIUrl":null,"url":null,"abstract":"<div><p>Bias stress stabilities of the polymethyl methacrylate (PMMA)-passivated IGZO thin-film transistors (TFTs) after being exposed in a normal and harsh (100 °C steam) environment were studied, in order to comprehensively evaluate protection effects of PMMA. In a normal environment, the PMMA-passivated TFTs exhibited normal switching characteristics and electrical stabilities. However, the switching characteristics and bias stress stabilities were changed after being exposed on 100 °C steam. There were negative V<sub>th</sub> shifts on the transfer curves of the steam-exposed IGZO TFTs. Our XPS analysis revealed that the negative ΔV<sub>th</sub> was related to the steam-induced H<sub>2</sub>O molecules throughout the IGZO films, which acted as electron donors to introduce more electrons in the front channel. Under PBS, the steam-exposed IGZO TFTs showed an abnormal negative V<sub>th</sub> shift while the un-exposed IGZO TFTs showed negligible V<sub>th</sub> shift. This abnormality was ascribed to the electrons released from steam-induced H<sub>2</sub>O molecules, which render the conductive path more easily opened. Under NBS, the steam-exposed IGZO TFT presented larger negative V<sub>th</sub> shift than the un-exposed TFT. This result was interpreted in terms of the steam-induced donor states (H<sub>2</sub>O molecules) near or at channel/insulator interface. Under PBTS and NBTS, the changes in V<sub>th</sub> for steam-exposed TFTs were similar to those for un-exposed TFTs. Such a similarity indicates that steam exposure had no effects on NBTS and PBTS stabilities. It was understood in terms that the steam-induced H<sub>2</sub>O<sup>+</sup> recombined with the electrons released from the steam-induced H<sub>2</sub>O molecules under bias stress, forming H<sub>2</sub>O to compensate the thermally-induced H<sub>2</sub>O adsorption. Our results suggest that one-micron-thick PMMA passivation layer enabled to protect IGZO TFTs from H<sub>2</sub>O in a normal environment, but it provided inadequate protection in a harsh environment. Therefore, a thicker PMMA passivation layer should be considered.</p></div>","PeriodicalId":21909,"journal":{"name":"Solid-state Electronics","volume":"215 ","pages":"Article 108893"},"PeriodicalIF":1.4000,"publicationDate":"2024-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid-state Electronics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S003811012400042X","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

Bias stress stabilities of the polymethyl methacrylate (PMMA)-passivated IGZO thin-film transistors (TFTs) after being exposed in a normal and harsh (100 °C steam) environment were studied, in order to comprehensively evaluate protection effects of PMMA. In a normal environment, the PMMA-passivated TFTs exhibited normal switching characteristics and electrical stabilities. However, the switching characteristics and bias stress stabilities were changed after being exposed on 100 °C steam. There were negative Vth shifts on the transfer curves of the steam-exposed IGZO TFTs. Our XPS analysis revealed that the negative ΔVth was related to the steam-induced H2O molecules throughout the IGZO films, which acted as electron donors to introduce more electrons in the front channel. Under PBS, the steam-exposed IGZO TFTs showed an abnormal negative Vth shift while the un-exposed IGZO TFTs showed negligible Vth shift. This abnormality was ascribed to the electrons released from steam-induced H2O molecules, which render the conductive path more easily opened. Under NBS, the steam-exposed IGZO TFT presented larger negative Vth shift than the un-exposed TFT. This result was interpreted in terms of the steam-induced donor states (H2O molecules) near or at channel/insulator interface. Under PBTS and NBTS, the changes in Vth for steam-exposed TFTs were similar to those for un-exposed TFTs. Such a similarity indicates that steam exposure had no effects on NBTS and PBTS stabilities. It was understood in terms that the steam-induced H2O+ recombined with the electrons released from the steam-induced H2O molecules under bias stress, forming H2O to compensate the thermally-induced H2O adsorption. Our results suggest that one-micron-thick PMMA passivation layer enabled to protect IGZO TFTs from H2O in a normal environment, but it provided inadequate protection in a harsh environment. Therefore, a thicker PMMA passivation layer should be considered.

查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
100 °C 蒸汽暴露后 PMMA 钝化铟镓锌氧化物薄膜晶体管的偏压稳定性
为了全面评估聚甲基丙烯酸甲酯(PMMA)的保护作用,研究了暴露在正常和恶劣(100 °C蒸汽)环境中的聚甲基丙烯酸甲酯(PMMA)钝化 IGZO 薄膜晶体管(TFT)的偏压稳定性。在正常环境下,经过 PMMA 钝化处理的 TFT 具有正常的开关特性和电气稳定性。然而,暴露在 100 °C 蒸汽中后,开关特性和偏压应力稳定性发生了变化。暴露在蒸汽中的 IGZO TFT 的转移曲线出现了负 V 移位。我们的 XPS 分析表明,负 ΔV 与整个 IGZO 薄膜中蒸汽诱导的 HO 分子有关,这些分子作为电子供体在前沟道中引入了更多电子。在 PBS 条件下,蒸汽暴露的 IGZO TFT 显示出异常的负 V 偏移,而未暴露的 IGZO TFT 的 V 偏移可以忽略不计。这种异常是由于蒸汽诱导的 HO 分子释放出电子,使导电路径更容易打开。在 NBS 条件下,蒸汽暴露的 IGZO TFT 比未暴露的 TFT 显示出更大的负 V 偏移。这一结果可以从沟道/绝缘体界面附近或界面上的蒸汽诱导供体态(HO 分子)来解释。在 PBTS 和 NBTS 条件下,蒸汽暴露 TFT 的 V 值变化与未暴露 TFT 相似。这种相似性表明,蒸汽暴露对 NBTS 和 PBTS 的稳定性没有影响。据理解,蒸汽诱导的 HO 与蒸汽诱导的 HO 分子在偏压应力下释放的电子重新结合,形成 HO 以补偿热诱导的 HO 吸附。我们的研究结果表明,在正常环境下,一微米厚的 PMMA 钝化层能够保护 IGZO TFT 免受 HO 的影响,但在恶劣环境下,其保护作用就显得不足了。因此,应考虑使用更厚的 PMMA 钝化层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Solid-state Electronics
Solid-state Electronics 物理-工程:电子与电气
CiteScore
3.00
自引率
5.90%
发文量
212
审稿时长
3 months
期刊介绍: It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.
期刊最新文献
Temperature influence on experimental analog behavior of MISHEMTs A novel method used to prepare PN junction by plasmon generated under pulsed laser irradiation on silicon chip Achieving 15.75% efficiency in solar cells: Advanced surface engineering using Tetra-Tert-Butyl-Tercarbazol-Benzonitrile and organic layer integration in n-type silicon wafer and hybrid Planar-Si systems Influence of Ag-Bi2S3 nanocomposites for highly sensitive and selective Cl2 gas sensors: Synthesis, characterization, and gas sensing performance Editorial Board
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1