{"title":"Bias stress stabilities of PMMA-passivated indium-gallium-zinc-oxide thin-film transistors after 100 °C steam exposure","authors":"Yuyun Chen , Guodong Xu , Yunpeng Yu , Yi Shen","doi":"10.1016/j.sse.2024.108893","DOIUrl":null,"url":null,"abstract":"<div><p>Bias stress stabilities of the polymethyl methacrylate (PMMA)-passivated IGZO thin-film transistors (TFTs) after being exposed in a normal and harsh (100 °C steam) environment were studied, in order to comprehensively evaluate protection effects of PMMA. In a normal environment, the PMMA-passivated TFTs exhibited normal switching characteristics and electrical stabilities. However, the switching characteristics and bias stress stabilities were changed after being exposed on 100 °C steam. There were negative V<sub>th</sub> shifts on the transfer curves of the steam-exposed IGZO TFTs. Our XPS analysis revealed that the negative ΔV<sub>th</sub> was related to the steam-induced H<sub>2</sub>O molecules throughout the IGZO films, which acted as electron donors to introduce more electrons in the front channel. Under PBS, the steam-exposed IGZO TFTs showed an abnormal negative V<sub>th</sub> shift while the un-exposed IGZO TFTs showed negligible V<sub>th</sub> shift. This abnormality was ascribed to the electrons released from steam-induced H<sub>2</sub>O molecules, which render the conductive path more easily opened. Under NBS, the steam-exposed IGZO TFT presented larger negative V<sub>th</sub> shift than the un-exposed TFT. This result was interpreted in terms of the steam-induced donor states (H<sub>2</sub>O molecules) near or at channel/insulator interface. Under PBTS and NBTS, the changes in V<sub>th</sub> for steam-exposed TFTs were similar to those for un-exposed TFTs. Such a similarity indicates that steam exposure had no effects on NBTS and PBTS stabilities. It was understood in terms that the steam-induced H<sub>2</sub>O<sup>+</sup> recombined with the electrons released from the steam-induced H<sub>2</sub>O molecules under bias stress, forming H<sub>2</sub>O to compensate the thermally-induced H<sub>2</sub>O adsorption. Our results suggest that one-micron-thick PMMA passivation layer enabled to protect IGZO TFTs from H<sub>2</sub>O in a normal environment, but it provided inadequate protection in a harsh environment. Therefore, a thicker PMMA passivation layer should be considered.</p></div>","PeriodicalId":21909,"journal":{"name":"Solid-state Electronics","volume":"215 ","pages":"Article 108893"},"PeriodicalIF":1.4000,"publicationDate":"2024-02-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid-state Electronics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S003811012400042X","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Bias stress stabilities of the polymethyl methacrylate (PMMA)-passivated IGZO thin-film transistors (TFTs) after being exposed in a normal and harsh (100 °C steam) environment were studied, in order to comprehensively evaluate protection effects of PMMA. In a normal environment, the PMMA-passivated TFTs exhibited normal switching characteristics and electrical stabilities. However, the switching characteristics and bias stress stabilities were changed after being exposed on 100 °C steam. There were negative Vth shifts on the transfer curves of the steam-exposed IGZO TFTs. Our XPS analysis revealed that the negative ΔVth was related to the steam-induced H2O molecules throughout the IGZO films, which acted as electron donors to introduce more electrons in the front channel. Under PBS, the steam-exposed IGZO TFTs showed an abnormal negative Vth shift while the un-exposed IGZO TFTs showed negligible Vth shift. This abnormality was ascribed to the electrons released from steam-induced H2O molecules, which render the conductive path more easily opened. Under NBS, the steam-exposed IGZO TFT presented larger negative Vth shift than the un-exposed TFT. This result was interpreted in terms of the steam-induced donor states (H2O molecules) near or at channel/insulator interface. Under PBTS and NBTS, the changes in Vth for steam-exposed TFTs were similar to those for un-exposed TFTs. Such a similarity indicates that steam exposure had no effects on NBTS and PBTS stabilities. It was understood in terms that the steam-induced H2O+ recombined with the electrons released from the steam-induced H2O molecules under bias stress, forming H2O to compensate the thermally-induced H2O adsorption. Our results suggest that one-micron-thick PMMA passivation layer enabled to protect IGZO TFTs from H2O in a normal environment, but it provided inadequate protection in a harsh environment. Therefore, a thicker PMMA passivation layer should be considered.
期刊介绍:
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.