Enhancing TFET performance through gate length optimization and doping control in phosphorene nanoribbons

Abstract

In this study, the performance of armchair phosphorene nanoribbons (APNRs) tunnel field-effect transistors (TFETs) is compared to that of conventional Metal-Oxide-Semiconductor Field-Effect Transistors (MOSFETs) based on the self-consistent solution of the Poisson and Schrödinger equation within the non-equilibrium Green's Function formalism and a tight-binding Hamiltonian. As channel length decreases, undesirable consequences such as increased OFF-current and sub-threshold swing can affect MOSFETs' performance. The study thoroughly investigates various aspects of TFET performance, including the impact of channel length, gate length, and doping on parameters like ON-current, OFF-current, the ON-/OFF-current ratio, and sub-threshold swing. An important finding of this research relates to the influence of source and drain doping. We demonstrate that fine-tuning impurity levels directly affects phosphorene nanoribbon TFET (PTFET) performance. The article also investigates the impact of gate length on PTFET performance. New transistor configurations with different gate lengths are proposed in this research. The study shows that optimizing gate length can significantly reduce OFF-current. Furthermore, the combined impact of gate length and doping concentration on PTFET performance is investigated. Through the strategic extension of the gate length towards the drain side and precise adjustments in doping levels, notable improvements in subthreshold swings, ON-current, and the ON-/OFF-current ratio can be realized.