Novel CoVO/WxOy composites for methylene blue photodegradation and electrocatalytic applications

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2024-11-15 DOI:10.1016/j.mssp.2024.109104
Areej Zubair , Faisal Nawaz , Masood ul Hassan Farooq , Iqra Fareed , Muhammad Danish Khan , Zulfiqar Ali , Mariam Nawaz , Hafiza Sadia Anam , Muhammad Tahir , Faheem K. Butt
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Abstract

To address environmental and energy concerns, CoVO/WxOy nanocomposites are hydrothermally fabricated and their structural and chemical properties are examined using XRD and FTIR. The surface morphology and optical characteristics are investigated with the help of FESEM and UV–Visible spectroscopy, respectively. CoVO/WxOy exhibits increased photocatalytic efficacy towards methylene blue degradation, attributed to its unique properties. Furthermore, the interface of CoVO/WxOy follows a Z-scheme mechanism for efficient charge transfer, with ·OH identified as the most reactive species. The composite catalyst also displays exceptional stability. CoVO/WxOy also presents the capability to produce H2 and O2 from water splitting at small overpotential values. These investigations are supported by small tafel slope, Cdl value and electrochemical active surface area. These findings suggest that CoVO/WxOy hold great promise for use in environmental remediation and sustainable energy generation.

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用于亚甲基蓝光降解和电催化应用的新型 CoVO/WxOy 复合材料
为了解决环境和能源问题,我们通过水热法制备了 CoVO/WxOy 纳米复合材料,并使用 XRD 和 FTIR 对其结构和化学特性进行了研究。此外,还分别利用 FESEM 和紫外-可见光谱对其表面形貌和光学特性进行了研究。CoVO/WxOy 对亚甲基蓝降解的光催化效率有所提高,这归功于其独特的性质。此外,CoVO/WxOy 的界面遵循 Z 型机制以实现有效的电荷转移,其中 -OH- 被确定为反应最活跃的物种。这种复合催化剂还显示出卓越的稳定性。CoVO/WxOy 还能在较小的过电位值下通过水分裂产生 H2 和 O2。较小的塔菲尔斜率、Cdl 值和电化学活性表面积为这些研究提供了支持。这些研究结果表明,CoVO/WxOy 在环境修复和可持续能源生产方面大有可为。
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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