Enhancing polarization switching, endurance, and fatigue in praseodymium and manganese co-doped bismuth ferrite thin films

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2024-12-01 DOI:10.1016/j.mssp.2024.109143
Shah Zahid Yousuf, Sreenivasulu Mamilla, N.V.L. Narsimha Murty
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Abstract

This study delves into the impact of praseodymium (Pr) and manganese (Mn) co-doping on electrical, and ferroelectric properties of bismuth ferrite (BFO) thin films deposited on fluorine tin oxide (FTO) coated glass substrates. The introduction of Pr and Mn dopants is found to influence the structure, surface morphology, and optical properties of BFO thin films. The variations in structure and polarization switching of the fabricated thin film devices, contingent upon the dopant and doping concentration, are investigated. The Pr and Mn co-doping changes the optical bandgap of BFO thin films, as a result of a shift in the absorption spectra. The induced defect states tailor the optical parameters leading to modification in oxygen vacancies. Among the doped samples, BFO thin film with 7 % Pr and 3 % Mn doping exhibited the lowest current density, by three orders of magnitude, attributed to the lowest oxygen vacancy concentration of 29 % inferred from the XPS studies. The effect of doping on the current conduction mechanism and the ferroelectric behavior in BFO thin film devices is further explored. Structural distortions as a result of co-doping are shown to enhance the remanent polarization of BFO thin films. It is noted that a maximum structural distortion of 0.07° in 3 % Pr and 7 % Mn-doped devices resulted in an increment in remanent polarization by approximately 4 times compared to the pristine BFO thin film devices. Device reliability, endurance, data retention, and fatigue are found to be influenced more by oxygen vacancies than by structural distortion. Thus, oxygen vacancies serve as preliminary indicators of endurance, data retention, and fatigue in Pr and Mn doped BFO thin films. Devices containing 7%Pr and 3%Mn exhibit improved data endurance and retention over multiple switching cycles, a benefit attributed to a decrease in oxygen vacancies. This study explores the relationship between intrinsic defects and their effects on data retention and fatigue, employing Pr-Mn co-doping as a strategic method to reduce oxygen vacancy defects and enhance device reliability. The Pr and Mn doped devices show significant promise for non-volatile memory applications.
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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