Enhancing polarization switching, endurance, and fatigue in praseodymium and manganese co-doped bismuth ferrite thin films

IF 4.6 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Materials Science in Semiconductor Processing Pub Date : 2025-03-15 Epub Date: 2024-12-01 DOI:10.1016/j.mssp.2024.109143
Shah Zahid Yousuf, Sreenivasulu Mamilla, N.V.L. Narsimha Murty
{"title":"Enhancing polarization switching, endurance, and fatigue in praseodymium and manganese co-doped bismuth ferrite thin films","authors":"Shah Zahid Yousuf,&nbsp;Sreenivasulu Mamilla,&nbsp;N.V.L. Narsimha Murty","doi":"10.1016/j.mssp.2024.109143","DOIUrl":null,"url":null,"abstract":"<div><div>This study delves into the impact of praseodymium <span><math><mrow><mo>(</mo><mi>Pr</mi><mo>)</mo></mrow></math></span> and manganese <span><math><mrow><mo>(</mo><mtext>Mn</mtext><mo>)</mo></mrow></math></span> co-doping on electrical, and ferroelectric properties of bismuth ferrite <span><math><mrow><mo>(</mo><mtext>BFO</mtext><mo>)</mo></mrow></math></span> thin films deposited on fluorine tin oxide <span><math><mrow><mo>(</mo><mtext>FTO</mtext><mo>)</mo></mrow></math></span> coated glass substrates. The introduction of <span><math><mrow><mi>Pr</mi></mrow></math></span> and <span><math><mrow><mtext>Mn</mtext></mrow></math></span> dopants is found to influence the structure, surface morphology, and optical properties of <span><math><mrow><mtext>BFO</mtext></mrow></math></span> thin films. The variations in structure and polarization switching of the fabricated thin film devices, contingent upon the dopant and doping concentration, are investigated. The <span><math><mrow><mi>Pr</mi></mrow></math></span> and <span><math><mrow><mtext>Mn</mtext></mrow></math></span> co-doping changes the optical bandgap of <span><math><mrow><mtext>BFO</mtext></mrow></math></span> thin films, as a result of a shift in the absorption spectra. The induced defect states tailor the optical parameters leading to modification in oxygen vacancies. Among the doped samples, <span><math><mrow><mtext>BFO</mtext></mrow></math></span> thin film with 7 % <span><math><mrow><mi>Pr</mi></mrow></math></span> and 3 % <span><math><mrow><mtext>Mn</mtext></mrow></math></span> doping exhibited the lowest current density, by three orders of magnitude, attributed to the lowest oxygen vacancy concentration of 29 % inferred from the XPS studies. The effect of doping on the current conduction mechanism and the ferroelectric behavior in <span><math><mrow><mtext>BFO</mtext></mrow></math></span> thin film devices is further explored. Structural distortions as a result of co-doping are shown to enhance the remanent polarization of <span><math><mrow><mtext>BFO</mtext></mrow></math></span> thin films. It is noted that a maximum structural distortion of 0.07° in 3 % <span><math><mrow><mi>Pr</mi></mrow></math></span> and 7 % <span><math><mrow><mtext>Mn</mtext></mrow></math></span>-doped devices resulted in an increment in remanent polarization by approximately <span><math><mrow><mn>4</mn></mrow></math></span> times compared to the pristine BFO thin film devices. Device reliability, endurance, data retention, and fatigue are found to be influenced more by oxygen vacancies than by structural distortion. Thus, oxygen vacancies serve as preliminary indicators of endurance, data retention, and fatigue in <span><math><mrow><mi>Pr</mi></mrow></math></span> and <span><math><mrow><mtext>Mn</mtext></mrow></math></span> doped BFO thin films. Devices containing <span><math><mrow><mn>7</mn><mo>%</mo><mspace></mspace><mi>Pr</mi></mrow></math></span> and <span><math><mrow><mn>3</mn><mo>%</mo><mspace></mspace><mtext>Mn</mtext></mrow></math></span> exhibit improved data endurance and retention over multiple switching cycles, a benefit attributed to a decrease in oxygen vacancies. This study explores the relationship between intrinsic defects and their effects on data retention and fatigue, employing Pr-Mn co-doping as a strategic method to reduce oxygen vacancy defects and enhance device reliability. The <span><math><mrow><mi>Pr</mi></mrow></math></span> and <span><math><mrow><mtext>Mn</mtext></mrow></math></span> doped devices show significant promise for non-volatile memory applications.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"188 ","pages":"Article 109143"},"PeriodicalIF":4.6000,"publicationDate":"2025-03-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800124010394","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2024/12/1 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

This study delves into the impact of praseodymium (Pr) and manganese (Mn) co-doping on electrical, and ferroelectric properties of bismuth ferrite (BFO) thin films deposited on fluorine tin oxide (FTO) coated glass substrates. The introduction of Pr and Mn dopants is found to influence the structure, surface morphology, and optical properties of BFO thin films. The variations in structure and polarization switching of the fabricated thin film devices, contingent upon the dopant and doping concentration, are investigated. The Pr and Mn co-doping changes the optical bandgap of BFO thin films, as a result of a shift in the absorption spectra. The induced defect states tailor the optical parameters leading to modification in oxygen vacancies. Among the doped samples, BFO thin film with 7 % Pr and 3 % Mn doping exhibited the lowest current density, by three orders of magnitude, attributed to the lowest oxygen vacancy concentration of 29 % inferred from the XPS studies. The effect of doping on the current conduction mechanism and the ferroelectric behavior in BFO thin film devices is further explored. Structural distortions as a result of co-doping are shown to enhance the remanent polarization of BFO thin films. It is noted that a maximum structural distortion of 0.07° in 3 % Pr and 7 % Mn-doped devices resulted in an increment in remanent polarization by approximately 4 times compared to the pristine BFO thin film devices. Device reliability, endurance, data retention, and fatigue are found to be influenced more by oxygen vacancies than by structural distortion. Thus, oxygen vacancies serve as preliminary indicators of endurance, data retention, and fatigue in Pr and Mn doped BFO thin films. Devices containing 7%Pr and 3%Mn exhibit improved data endurance and retention over multiple switching cycles, a benefit attributed to a decrease in oxygen vacancies. This study explores the relationship between intrinsic defects and their effects on data retention and fatigue, employing Pr-Mn co-doping as a strategic method to reduce oxygen vacancy defects and enhance device reliability. The Pr and Mn doped devices show significant promise for non-volatile memory applications.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
提高镨锰共掺铋铁氧体薄膜的极化开关、耐久性和疲劳性能
本研究探讨了镨(Pr)和锰(Mn)共掺杂对氟氧化锡(FTO)镀膜玻璃基板上铋铁氧体(BFO)薄膜电学和铁电性能的影响。Pr和Mn掺杂剂的引入影响了BFO薄膜的结构、表面形貌和光学性能。研究了所制备薄膜器件的结构和极化开关随掺杂剂和掺杂浓度的变化。Pr和Mn共掺杂改变了BFO薄膜的光学带隙,这是由于吸收光谱的移位。诱导的缺陷态调整了光学参数,导致氧空位的改变。在掺杂样品中,7% Pr和3% Mn掺杂的BFO薄膜表现出最低的电流密度,达到三个数量级,这是由于XPS研究推断的最低氧空位浓度为29%。进一步探讨了掺杂对BFO薄膜器件电流传导机制和铁电行为的影响。共掺杂导致的结构畸变增强了BFO薄膜的剩余极化。在3% Pr和7% mn掺杂的器件中,最大结构畸变为0.07°,与原始BFO薄膜器件相比,剩余极化增加了约4倍。研究发现,氧空位比结构畸变更能影响器件的可靠性、耐用性、数据保留和疲劳。因此,氧空位可以作为Pr和Mn掺杂BFO薄膜的耐久性、数据保留性和疲劳性的初步指标。含有7%Pr和3%Mn的器件在多个开关周期中表现出更好的数据耐用性和保留性,这得益于氧空位的减少。本研究探讨了内在缺陷及其对数据保留和疲劳的影响之间的关系,采用Pr-Mn共掺杂作为减少氧空位缺陷和提高器件可靠性的策略方法。Pr和Mn掺杂器件在非易失性存储器应用中显示出重要的前景。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
期刊最新文献
Preparation and optoelectronic properties of large area GaN crystalline films by MPCVD Corrosion of electroplated Cu in photoresist stripper Highly sensitive photoelectrochemical aptasensor based on Bi2S3/CdS/TiO2NRA nanorod arrays for alpha-fetoprotein detection Through-InP-via-embedded 3D metal interconnection technology between InP and SiC substrates for RF application Enhanced photocatalytic degradation of rhodamine B by a novel MT-TiO2/Bi2S3 composite under simulated solar light
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1