Excitation intensity and temperature dependence of photoluminescence in mid-infrared region for lattice-matched InAs/GaAsSb superlattice grown by metalorganic vapor-phase epitaxy

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-01-10 DOI:10.1007/s10854-024-14142-7
Koji Maeda, Takeshi Fujisawa, Masakazu Arai
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Abstract

Lattice-matched InAs/GaAs0.08Sb0.92 superlattices were grown on InAs substrates via metalorganic vapor-phase epitaxy, and the excitation intensity dependence of photoluminescence (PL) was measured from 20 to 300 K. The observed spectra were compared with the calculated spontaneous emission transitions. At 20 K, the changes in the calculated and measured spectral shapes with the carrier density in the wells closely concur. The blue shift of the emission peak, as the excitation intensity increased, was due to emission from a higher-order band. We determined the specific wavelengths at which the luminescence intensity increased rapidly at certain excitation intensities. These results broaden the spectral range. At 300 K, the PL spectrum was obtained only under strong excitation. Furthermore, higher-order transitions were also dominant in this case.

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金属有机气相外延生长的晶格匹配InAs/GaAsSb超晶格中红外区光致发光的激发强度和温度依赖性
采用金属有机气相外延的方法在InAs衬底上生长了晶格匹配的InAs/GaAs0.08Sb0.92超晶格,并在20 ~ 300 K范围内测量了光致发光(PL)的激发强度依赖性。将观测到的光谱与计算得到的自发发射跃迁进行了比较。在20 K时,计算和测量的光谱形状的变化与井中的载流子密度密切一致。随着激发强度的增加,发射峰的蓝移是由高阶波段发射引起的。我们确定了在一定激发强度下发光强度迅速增加的特定波长。这些结果扩大了光谱范围。在300 K时,只有在强激发下才能得到PL谱。此外,在这种情况下,高阶转换也占主导地位。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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