Modification of the Se/MoOx Rear Interface for Efficient Wide-Band-Gap Trigonal Selenium Solar Cells

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-01-15 DOI:10.1021/acsami.4c15892
Feixiong Bao, Lianglan Liu, Xinlong Wang, Binquan Xiao, Huanyong Li, Huidong Yang, Kai Shen, Yaohua Mai
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Abstract

Trigonal selenium (t-Se) is a promising wide-band-gap photovoltaic material with a high absorption coefficient, abundant resources, simple composition, nontoxicity, and a low melting point, making it suitable for absorbers in advanced indoor and tandem photovoltaic applications. However, severe electrical losses at the rear interface of the t-Se absorber, caused by work function and lattice mismatches, limit the voltage output and overall performance. In this study, a strategy to enhance carrier transport and collection by modifying interfacial chemical interactions is proposed. By applying a controlled heat process during the deposition of the MoOx hole transport layer, a chemical interaction at the t-Se/MoOx interface can be facilitated. This results in the formation of an interfacial MoSex layer, leading to improved valence band alignment and reduced barrier and recombination losses. As a result, the performance of t-Se thin-film solar cells is improved compared to those without the heating process.

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ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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