Modification of the Se/MoOx Rear Interface for Efficient Wide-Band-Gap Trigonal Selenium Solar Cells

IF 8.2 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY ACS Applied Materials & Interfaces Pub Date : 2025-01-15 DOI:10.1021/acsami.4c15892
Feixiong Bao, Lianglan Liu, Xinlong Wang, Binquan Xiao, Huanyong Li, Huidong Yang, Kai Shen, Yaohua Mai
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Abstract

Trigonal selenium (t-Se) is a promising wide-band-gap photovoltaic material with a high absorption coefficient, abundant resources, simple composition, nontoxicity, and a low melting point, making it suitable for absorbers in advanced indoor and tandem photovoltaic applications. However, severe electrical losses at the rear interface of the t-Se absorber, caused by work function and lattice mismatches, limit the voltage output and overall performance. In this study, a strategy to enhance carrier transport and collection by modifying interfacial chemical interactions is proposed. By applying a controlled heat process during the deposition of the MoOx hole transport layer, a chemical interaction at the t-Se/MoOx interface can be facilitated. This results in the formation of an interfacial MoSex layer, leading to improved valence band alignment and reduced barrier and recombination losses. As a result, the performance of t-Se thin-film solar cells is improved compared to those without the heating process.

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高效宽带隙三角形硒太阳能电池Se/MoOx后界面的改进
三角硒(t-Se)具有吸收系数高、资源丰富、成分简单、无毒、熔点低等优点,是一种很有发展前途的宽禁带光伏材料,适用于先进的室内和串联光伏吸收材料。然而,由于功函数和晶格不匹配导致的t-Se吸收器后界面严重的电损失限制了电压输出和整体性能。在这项研究中,提出了一种通过改变界面化学相互作用来增强载流子运输和收集的策略。通过在MoOx空穴传输层沉积过程中施加可控的加热过程,可以促进t-Se/MoOx界面的化学相互作用。这导致了界面MoSex层的形成,从而改善了价带排列,减少了势垒和复合损失。因此,与没有加热过程的电池相比,t-Se薄膜太阳能电池的性能得到了改善。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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