Fabrication of PS/Si3N4/SrTiO3 multifunctional nanocomposites and boosting their microstructure and optical and dielectric features for energy storage and nanodielectric applications

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC Journal of Materials Science: Materials in Electronics Pub Date : 2025-02-13 DOI:10.1007/s10854-025-14295-z
Ahmed Hashim, Hamed Ibrahim, Aseel Hadi
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Abstract

The aim of this study was to fabricate Si3N4–SrTiO3 nanomaterial-doped polystyrene (PS) to utilize in futuristic photonics and nanoelectronics applications. The structural, electrical, and optical features of PS/Si3N4/SrTiO3 films were investigated. The results indicated a percentage increment of the absorption above that of PS of 90% at λ = 300 nm and 95.8% at λ = 800 nm when increasing the Si3N4/SrTiO3 concentration to 6.6 wt.%. The bandgap of PS decreased from 4.22 to 2.4 eV for the allowed transition but reduced from 4.1 to 1.5 eV for the forbidden transition when increasing the Si3N4/SrTiO3 nanoparticle (NP) ratio to 6.6 wt.%, a behavior that makes such materials favorable for use in many optoelectronics approaches. The optical features of the PS were improved when increasing the Si3N4/SrTiO3 NP concentration, making such PS/Si3N4/SrTiO3 films potential materials for use in optical fields. The dielectric properties show that the dielectric constant of PS at 100 Hz was improved from 3.34 to 4 while the alternating-current (AC) conductivity increased from 7.61 × 10–12 to 1.78 × 10–11 S/cm when the Si3N4/SrTiO3 NP content reached 6.6 wt.%. Finally, the results confirm that such PS/Si3N4/SrTiO3 films could be considered as promising materials for use in nanoelectronics and optical applications.

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PS/Si3N4/SrTiO3多功能纳米复合材料的制备及其在储能和纳米介质应用中的微观结构、光学和介电特性
本研究的目的是制备掺杂聚苯乙烯(PS)的Si3N4-SrTiO3纳米材料,用于未来光子学和纳米电子学的应用。研究了PS/Si3N4/SrTiO3薄膜的结构、电学和光学特性。结果表明,当Si3N4/SrTiO3的浓度增加到6.6 wt.%时,在λ = 300 nm处的吸收率增加了90%,在λ = 800 nm处的吸收率增加了95.8%。当Si3N4/SrTiO3纳米颗粒(NP)的比例增加到6.6 wt.%时,PS的带隙从4.22 eV降低到2.4 eV,而在禁止跃迁时,带隙从4.1 eV降低到1.5 eV,这一行为使得这种材料有利于许多光电子学方法的使用。随着Si3N4/SrTiO3 NP浓度的增加,PS/Si3N4/SrTiO3薄膜的光学特性得到改善,这使得PS/Si3N4/SrTiO3薄膜成为光学领域的潜在材料。介电性能表明,当Si3N4/SrTiO3 NP含量达到6.6 wt.%时,PS在100 Hz时的介电常数由3.34提高到4,交流电导率由7.61 × 10-12提高到1.78 × 10-11 S/cm。最后,结果证实了这种PS/Si3N4/SrTiO3薄膜可以被认为是纳米电子和光学应用的有前途的材料。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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