Influence of Temperature, Strain Rate, and Vacancies on the Mechanical Properties of Aluminum-Doped Bilayer Silicene

IF 2.1 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC IEEE Transactions on Nanotechnology Pub Date : 2025-02-28 DOI:10.1109/TNANO.2025.3546749
Alexandre Melhorance Barboza;Luis César Rodríguez Aliaga;Daiara Fernandes de Faria;Ivan Napoleão Bastos
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Abstract

Silicene, a two-dimensional material with promising potential for future technological applications, has attracted considerable attention over the past decade. Recent research has focused on modifying silicene's electronic and magnetic properties by means of adsorption or substitutional doping. While the magnetic, electronic, and optical properties of doped silicene have been extensively studied, there is a noticeable gap in the literature regarding its mechanical properties. To address this issue, this study explores the mechanical characteristics of bilayer silicene doped with aluminum under various conditions. By employing molecular dynamics simulations, we investigate the influence of aluminum concentration, defects, temperature, and strain rate on the material's mechanical response. The findings reveal a monotonically decreasing strength with Al concentration in both the zigzag and armchair straining directions. Additionally, the material exhibits high sensitivity to defects, with even a small percentage significantly impairing its mechanical properties. Directional dependence is also observed, with the zigzag direction showing greater sensitivity than the armchair. As strain progresses, initial mono-vacancies evolve into more complex defects, hindering predictions of the mechanical response in certain cases. Lastly, strain rate sensitivity is evaluated, yielding values of 0.0485 and 0.0365 for the zigzag and armchair directions, respectively.
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来源期刊
IEEE Transactions on Nanotechnology
IEEE Transactions on Nanotechnology 工程技术-材料科学:综合
CiteScore
4.80
自引率
8.30%
发文量
74
审稿时长
8.3 months
期刊介绍: The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.
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