Novel staggered quantum well design and in-surfactant GaN buffer layer in UVA light emitting diode heterostructures

IF 4.2 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY Optical Materials Pub Date : 2025-05-01 Epub Date: 2025-03-13 DOI:10.1016/j.optmat.2025.116934
Nor Syafiqah Azmi , Muhammad Shahrul Nizam Suri , Noratiqah Yusop , Mohd Ann Amirul Zulffiqal Md Sahar , Mohd Anas Ahmad , Muhamad Ikram Md Taib , Mohd Nazri Abd Rahman , Muhammad Iznul Hisyam , Tan Swee Tiam , Ahmad Fakhrurrazi Ahmad Noorden , Mohammad Amirul Hairol Aman , Norzaini Zainal
{"title":"Novel staggered quantum well design and in-surfactant GaN buffer layer in UVA light emitting diode heterostructures","authors":"Nor Syafiqah Azmi ,&nbsp;Muhammad Shahrul Nizam Suri ,&nbsp;Noratiqah Yusop ,&nbsp;Mohd Ann Amirul Zulffiqal Md Sahar ,&nbsp;Mohd Anas Ahmad ,&nbsp;Muhamad Ikram Md Taib ,&nbsp;Mohd Nazri Abd Rahman ,&nbsp;Muhammad Iznul Hisyam ,&nbsp;Tan Swee Tiam ,&nbsp;Ahmad Fakhrurrazi Ahmad Noorden ,&nbsp;Mohammad Amirul Hairol Aman ,&nbsp;Norzaini Zainal","doi":"10.1016/j.optmat.2025.116934","DOIUrl":null,"url":null,"abstract":"<div><div>We propose a novel symmetric InGaN staggered quantum well (SQW) design for the growth of an InGaN/GaN UVA LED heterostructure, aiming at improving carriers’ confinement in the multi-quantum well (MQW) active region of the LED, especially at higher currents. In comparison to conventional methods, the SQW was inserted only in the last two QWs to shorten the overall growth time. Additionally, indium-surfactant was introduced during the growth of GaN buffer layer (In-surfactant GaN buffer layer) as an effort to improve the MQW growth further. With respect to the reference LED, i.e. without the SQW and the In-surfactant GaN buffer layer, the crystalline and surface properties improve for the LED with both SQW and In-surfactant GaN buffer layer. Moreover, the forward voltage can be as low as 3.23 V and the output power reaches approximately 25 mW at 100 mA with the SQW and In-surfactant GaN buffer layer.</div></div>","PeriodicalId":19564,"journal":{"name":"Optical Materials","volume":"162 ","pages":"Article 116934"},"PeriodicalIF":4.2000,"publicationDate":"2025-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optical Materials","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0925346725002940","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"2025/3/13 0:00:00","PubModel":"Epub","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
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Abstract

We propose a novel symmetric InGaN staggered quantum well (SQW) design for the growth of an InGaN/GaN UVA LED heterostructure, aiming at improving carriers’ confinement in the multi-quantum well (MQW) active region of the LED, especially at higher currents. In comparison to conventional methods, the SQW was inserted only in the last two QWs to shorten the overall growth time. Additionally, indium-surfactant was introduced during the growth of GaN buffer layer (In-surfactant GaN buffer layer) as an effort to improve the MQW growth further. With respect to the reference LED, i.e. without the SQW and the In-surfactant GaN buffer layer, the crystalline and surface properties improve for the LED with both SQW and In-surfactant GaN buffer layer. Moreover, the forward voltage can be as low as 3.23 V and the output power reaches approximately 25 mW at 100 mA with the SQW and In-surfactant GaN buffer layer.
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UVA发光二极管异质结构中新型交错量子阱设计和表面活性剂内GaN缓冲层
我们提出了一种新的对称InGaN交错量子阱(SQW)设计,用于生长InGaN/GaN UVA LED异质结构,旨在改善LED多量子阱(MQW)有源区域的载流子约束,特别是在高电流下。与传统方法相比,SQW只插入到最后两个qw中,以缩短整体生长时间。此外,在GaN缓冲层(in -表面活性剂GaN缓冲层)的生长过程中引入了铟表面活性剂,以进一步改善MQW的生长。相对于参考LED,即没有SQW和表面活性剂GaN缓冲层,有SQW和表面活性剂GaN缓冲层的LED的晶体和表面性能得到改善。此外,在SQW和表面活性剂GaN缓冲层的作用下,正向电压可低至3.23 V,在100 mA时输出功率约为25 mW。
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来源期刊
Optical Materials
Optical Materials 工程技术-材料科学:综合
CiteScore
6.60
自引率
12.80%
发文量
1265
审稿时长
38 days
期刊介绍: Optical Materials has an open access mirror journal Optical Materials: X, sharing the same aims and scope, editorial team, submission system and rigorous peer review. The purpose of Optical Materials is to provide a means of communication and technology transfer between researchers who are interested in materials for potential device applications. The journal publishes original papers and review articles on the design, synthesis, characterisation and applications of optical materials. OPTICAL MATERIALS focuses on: • Optical Properties of Material Systems; • The Materials Aspects of Optical Phenomena; • The Materials Aspects of Devices and Applications. Authors can submit separate research elements describing their data to Data in Brief and methods to Methods X.
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