Two-dimensional silica opens new perspectives

IF 8.7 2区 工程技术 Q1 CHEMISTRY, PHYSICAL Progress in Surface Science Pub Date : 2017-12-01 DOI:10.1016/j.progsurf.2017.09.001
Christin Büchner, Markus Heyde
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引用次数: 69

Abstract

In recent years, silica films have emerged as a novel class of two-dimensional (2D) materials. Several groups succeeded in epitaxial growth of ultrathin SiO2 layers using different growth methods and various substrates. The structures consist of tetrahedral [SiO4] building blocks in two mirror symmetrical planes, connected via oxygen bridges. This arrangement is called a silica bilayer as it is the thinnest 2D arrangement with the stoichiometry SiO2 known today. With all bonds saturated within the nano-sheet, the interaction with the substrate is based on van der Waals forces. Complex ring networks are observed, including hexagonal honeycomb lattices, point defects and domain boundaries, as well as amorphous domains. The network structures are highly tuneable through variation of the substrate, deposition parameters, cooling procedure, introducing dopants or intercalating small species.

The amorphous networks and structural defects were resolved with atomic resolution microscopy and modeled with density functional theory and molecular dynamics. Such data contribute to our understanding of the formation and characteristic motifs of glassy systems. Growth studies and doping with other chemical elements reveal ways to tune ring sizes and defects as well as chemical reactivities. The pristine films have been utilized as molecular sieves and for confining molecules in nanocatalysis. Post growth hydroxylation can be used to tweak the reactivity as well.

The electronic properties of silica bilayers are favourable for using silica as insulators in 2D material stacks. Due to the fully saturated atomic structure, the bilayer interacts weakly with the substrate and can be described as quasi-freestanding. Recently, a mm-scale film transfer under structure retention has been demonstrated. The chemical and mechanical stability of silica bilayers is very promising for technological applications in 2D heterostacks.

Due to the impact of this bilayer system for glass science, catalysis and the field of 2D materials, a large number of theoretical and experimental studies on silica bilayers have been reported in the last years. This review aims to provide an overview on the insights gained on this material and to point out opportunities for further discovery in various fields.

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二维二氧化硅开启了新的视角
近年来,二氧化硅薄膜作为一种新型的二维(2D)材料出现。几个研究组使用不同的生长方法和不同的衬底成功地外延生长了超薄SiO2层。该结构由两个镜面对称平面上的四面体[SiO4]建筑块组成,通过氧桥连接。这种排列被称为二氧化硅双分子层,因为它是目前已知的具有化学计量SiO2的最薄的二维排列。当纳米片内的所有键都饱和时,与衬底的相互作用是基于范德华力的。观察到复杂的环形网络,包括六边形蜂窝晶格,点缺陷和区域边界,以及非晶区域。通过改变衬底、沉积参数、冷却程序、引入掺杂剂或插入小物质,网络结构具有高度可调谐性。利用原子分辨显微镜分析了非晶态网络和结构缺陷,并用密度泛函理论和分子动力学建模。这些数据有助于我们理解玻璃系的形成和特征基序。生长研究和掺杂其他化学元素揭示了调整环尺寸和缺陷以及化学反应的方法。原始膜已被用作分子筛和限制分子在纳米催化。生长后羟基化也可以用来调整反应性。二氧化硅双分子层的电子特性有利于在二维材料堆中使用二氧化硅作为绝缘体。由于完全饱和的原子结构,双分子层与底物的相互作用弱,可以描述为准独立的。最近,研究人员证实了结构保留下的毫米尺度薄膜转移。二氧化硅双分子层的化学和机械稳定性在二维异质堆叠中具有广阔的应用前景。由于这种双层体系对玻璃科学、催化和二维材料领域的影响,近年来有大量关于二氧化硅双层的理论和实验研究报道。这篇综述的目的是提供对这些材料的见解的概述,并指出在各个领域进一步发现的机会。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Progress in Surface Science
Progress in Surface Science 工程技术-物理:凝聚态物理
CiteScore
11.30
自引率
0.00%
发文量
10
审稿时长
3 months
期刊介绍: Progress in Surface Science publishes progress reports and review articles by invited authors of international stature. The papers are aimed at surface scientists and cover various aspects of surface science. Papers in the new section Progress Highlights, are more concise and general at the same time, and are aimed at all scientists. Because of the transdisciplinary nature of surface science, topics are chosen for their timeliness from across the wide spectrum of scientific and engineering subjects. The journal strives to promote the exchange of ideas between surface scientists in the various areas. Authors are encouraged to write articles that are of relevance and interest to both established surface scientists and newcomers in the field.
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