Microstructure evolution in a sandwich structure of Ni/SnAg/Ni microbump during reflow

Yu-Chun Liang, Chih Chen
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引用次数: 1

Abstract

The microstructure evolution in the sandwich structure of Ni/Sn2.3Ag/Ni microbumps with 4 μm and 12 μm in solder thickness during reflowing process at 260 °C was revealed in this study. When the microbumps with 4 μm in solder thickness were subjected to a 4-min reflow, the intermetallic compounds (IMCs) formed at the interface of the Ni under-bump-metallization (UBM) and the solder were Ni3Sn4, and Ag3Sn IMCs were formed dispersedly in the solder matrix. After the reflowing time reached 34 min, the Ni3Sn4 IMCs almost occupied the entire interface, and there were some voids remained in the Ni3Sn4 IMCs. The out-flowing of solder and the “side-attack” effect were responsible for the void formation. Finally, the remaining solder solidified through the out-flowing process, and the plate-like Ag3Sn IMCs were formed at the edge of the microbumps. Thus, the mechanical strength of the heterogeneous phase boundaries between Ag3Sn and Ni3Sn4 will play a crucial role in affecting the reliability of the microbumps in three dimensional integrated circuit (3D IC) applications. By comparison, the growth rate of Ni3Sn4 IMCs in the microbumps with 12 μm in solder thickness was somewhat slower than that of the case with 4 μm in solder thickness. However, the solder thickness just have little influence on the growth rate of the Ni3Sn4 IMCs in the microbumps, since the parabolic constant, k, in both cases are of the same order.
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Ni/SnAg/Ni微碰撞夹层结构在回流过程中的组织演变
研究了在260℃回流过程中,厚度分别为4 μm和12 μm的Ni/Sn2.3Ag/Ni微凸起夹层结构的微观组织演变过程。当钎料厚度为4 μm的微凸点回流4 min时,镍凸点下金属化层(UBM)与钎料界面形成的金属间化合物(IMCs)为Ni3Sn4,而Ag3Sn IMCs则分散在钎料基体中形成。回流时间达到34 min后,Ni3Sn4 IMCs几乎占据了整个界面,并且在Ni3Sn4 IMCs中保留了一些空隙。焊料的外流和“侧攻”效应是导致空洞形成的主要原因。最后,残余焊料通过流出过程凝固,在微凸起边缘形成片状Ag3Sn IMCs。因此,在三维集成电路(3D IC)应用中,Ag3Sn和Ni3Sn4之间的非均匀相边界的机械强度将对影响微凸点的可靠性起至关重要的作用。相比之下,Ni3Sn4 IMCs在锡料厚度为12 μm的微凸起中的生长速度略慢于锡料厚度为4 μm的微凸起。然而,钎料厚度对Ni3Sn4 IMCs生长速率的影响很小,因为在这两种情况下,抛物线常数k是相同的数量级。
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