Impact of stray field on the switching properties of perpendicular MTJ for scaled MRAM

Yung-Hung Wang, Sheng-Huang Huang, Ding-Yeong Wang, K. Shen, C. Chien, Keng-Ming Kuo, Shan-Yi Yang, D. Deng
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引用次数: 22

Abstract

For the first time, we show the stray field (Hs) from the pinned layer of perpendicular magnetic tunnel junctions (pMTJs) plays multiple important roles: its out-of-plane component degrades pinned layer stability of scaled MTJ, while its in-plane component assists spin-transfer torque switching. Through stray field engineering, one can retain its advantage, and minimized its detrimental effect. We also show that etching process plays a vital role in the stray-field engineering. Our pMTJ exhibits robust pinned layer performance, symmetrical R-H loop and balanced spin-torque switching current. The switching current of our pMTJ is ~60uA@20us for a 80nm diameter pMTJ.
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杂散场对尺度MRAM垂直MTJ开关特性的影响
本文首次揭示了垂直磁隧道结(pMTJs)钉住层的杂散场(Hs)具有多重重要作用:其面外分量降低了钉住层的稳定性,而其面内分量则有助于自旋传递转矩的切换。通过杂散场工程,既能保留其优势,又能将其不利影响降到最低。我们还证明了蚀刻工艺在杂散场工程中起着至关重要的作用。我们的pMTJ具有强大的钉住层性能,对称的R-H回路和平衡的自旋转矩开关电流。对于直径为80nm的pMTJ,我们的开关电流为~60uA@20us。
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