Photoluminescence quenching by electric fields in hydrogenated amorphous silicon

T. Muschik, R. Schwarz, H. Curtins, M. Favre
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引用次数: 2

Abstract

The decrease of photoluminescence (PL) intensity at low temperature was measured as a function of external fields (up to 3*10/sup 5/ V/cm) in hydrogenated amorphous silicon (a-Si:H). The results are discussed within the framework of the recombination of geminate pairs together with basic physical phenomena such as carrier separation during thermalization trapping of photoexcited carriers in band tails, and possible subsequent reemission or tunneling out of traps. It is concluded that separation of carriers during relaxation in extended and flat tail states is the dominant process for the field quenching of PL intensity. But other processes such as Poole-Frenkel emission and tunneling out of traps cannot be ruled out totally. The basic idea of carrier separation is supported by consistent values for the average mobility from both the quenching of PL intensity with electric fields and the concomitant energy shift of the maximum in the PL spectra.<>
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氢化非晶硅的电场致光猝灭
测量了氢化非晶硅(a- si:H)在低温下的光致发光(PL)强度随外加电场(高达3*10/sup 5/ V/cm)的变化规律。讨论了这些结果,并结合了一些基本的物理现象,如光激发载流子在带尾的热化捕获过程中的载流子分离,以及随后可能的再发射或隧穿出陷阱。结果表明,在扩展尾和平尾弛豫状态下载流子的分离是导致PL强度场猝灭的主要原因。但也不能完全排除其他过程,如普尔-弗伦克尔发射和隧道出陷阱。载流子分离的基本思想得到了电场对PL强度的猝灭和PL光谱中最大值的伴随能量位移的平均迁移率的一致值的支持。
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