Radiation resistance studies of amorphous silicon films

J. Payson, J. R. Woodyard
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引用次数: 3

Abstract

A study of hydrogenated amorphous silicon thin films irradiated with 2.00 MeV helium ions using fluences ranging from 1E11 to 1E15 cm/sup -2/ is presented. The films were characterized using photothermal deflection spectroscopy, transmission and reflection spectroscopy, and photoconductivity and annealing measurements. Large changes were observed in the subband-gap optical absorption for energies between 0.9 and 1.7 eV. The steady-state photoconductivity showed decreases of almost five orders of magnitude for a fluence of 1E15 cm/sup -2/, but the slope of the intensity dependence of the photoconductivity remained almost constant for all fluences. Substantial annealing occurs even at room temperature, and for temperatures greater than 448 K the damage is completely annealed. The data are analyzed to describe the defects and the density of states function.<>
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非晶硅薄膜的耐辐射性能研究
本文研究了用2.00 MeV氦离子辐照氢化非晶硅薄膜,影响范围为1E11 ~ 1E15 cm/sup -2/。利用光热偏转光谱、透射和反射光谱、光电导率和光退火测量对薄膜进行了表征。在0.9 ~ 1.7 eV能量范围内,亚带隙光吸收变化较大。在1E15 cm/sup -2/的影响下,稳态光电导率下降了近5个数量级,但在所有影响下,光电导率的强度依赖性斜率几乎保持不变。即使在室温下也会发生大量退火,当温度大于448 K时,损伤完全退火。对数据进行了分析,以描述缺陷和态密度函数
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