A non-linear ReRAM cell with sub-1μA ultralow operating current for high density vertical resistive memory (VRRAM)

Seong-Geon Park, M. Yang, H. Ju, D. Seong, Jung Moo Lee, Eunmi Kim, Seungjae Jung, Lijie Zhang, Yoocheol Shin, I. Baek, Jungdal Choi, Ho-Kyu Kang, C. Chung
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引用次数: 75

Abstract

A non-linear RRAM cell with sub-1μA ultralow operating current has been successfully fabricated for high density vertical ReRAM (VRRAM) applications. A uniform and reproducible low power resistive switching was achieved by engineering transition metal oxides and imposing thin insulating layer as a tunnel barrier. The non-linear I-V characteristics ensure the possible incorporation of RRAM cell into high density cross-type array structure including VRRAM. By varying the current compliance, a multi level switching behavior was obtained. Moreover, excellent endurance of more than 107 cycles without read disturbance for up to 104 seconds was demonstrated.
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用于高密度垂直电阻式存储器(VRRAM)的亚1μA超低工作电流非线性单元
成功制备了一种工作电流低于1μA的非线性RRAM单元,用于高密度垂直RRAM (VRRAM)应用。通过工程过渡金属氧化物和施加薄绝缘层作为隧道阻挡层,实现了均匀和可重复的低功率电阻开关。非线性的I-V特性保证了将RRAM单元整合到包括VRRAM在内的高密度交叉型阵列结构中的可能性。通过改变电流顺应性,获得了多电平开关行为。此外,在长达104秒的时间内,具有超过107个循环而不受读取干扰的优异耐久性。
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