Comprehensive Thermal SPICE Modeling of FinFETs and BEOL with Layout Flexibility Considering Frequency Dependent Thermal Time Constant, 3D Heat Flows, Boundary/Alloy Scattering, and Interfacial Thermal Resistance with Circuit Level Reliability Evaluation

Jhih-Yang Yan, Chia-Che Chung, Sun-Rong Jan, H. H. Lin, W. K. Wan, M. Yang, C. Liu
{"title":"Comprehensive Thermal SPICE Modeling of FinFETs and BEOL with Layout Flexibility Considering Frequency Dependent Thermal Time Constant, 3D Heat Flows, Boundary/Alloy Scattering, and Interfacial Thermal Resistance with Circuit Level Reliability Evaluation","authors":"Jhih-Yang Yan, Chia-Che Chung, Sun-Rong Jan, H. H. Lin, W. K. Wan, M. Yang, C. Liu","doi":"10.1109/VLSIT.2018.8510701","DOIUrl":null,"url":null,"abstract":"Thermal SPICE modeling with distributed R<inf>th</inf>-C<inf>th</inf> network is proposed to provide more accurate AC self-heating (SH) results than two τ<inf>c</inf> and one τ<inf>c</inf> models. The thermal time constant of the hotspot (τhotspot) in FinFETs is frequency dependent, not a constant. The severe SH by boundary/alloy scattering and interfacial thermal resistance (ITR) is included in our SPICE. The modularized components of fins, metals, and IMDs provide device and routing flexibility, without additional FEM simulation. ITR of Si<inf>80</inf>Ge<inf>20</inf>/Si<inf>1-</inf>xGe<inf>x</inf> is calculated by AMM model as the lower bound for SiGe FinFETs. The intrinsic electromigration (EM) improvement of Co interconnect (5X) is countervailed (5X→2.44X) by the increasing T<inf>metal</inf> due to the low thermal conductivity of Co. Different V2 placements on the power line of a ring oscillator (RO) are proposed to lower both the T<inf>j</inf> (FinFET) and T<inf>metal</inf>. The predicted EM MTTF of Co interconnect with the additional heat dissipation by V2 insertion is ~5.65X of W/Cu interconnect.","PeriodicalId":6561,"journal":{"name":"2018 IEEE Symposium on VLSI Technology","volume":"54 1","pages":"113-114"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2018.8510701","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

Thermal SPICE modeling with distributed Rth-Cth network is proposed to provide more accurate AC self-heating (SH) results than two τc and one τc models. The thermal time constant of the hotspot (τhotspot) in FinFETs is frequency dependent, not a constant. The severe SH by boundary/alloy scattering and interfacial thermal resistance (ITR) is included in our SPICE. The modularized components of fins, metals, and IMDs provide device and routing flexibility, without additional FEM simulation. ITR of Si80Ge20/Si1-xGex is calculated by AMM model as the lower bound for SiGe FinFETs. The intrinsic electromigration (EM) improvement of Co interconnect (5X) is countervailed (5X→2.44X) by the increasing Tmetal due to the low thermal conductivity of Co. Different V2 placements on the power line of a ring oscillator (RO) are proposed to lower both the Tj (FinFET) and Tmetal. The predicted EM MTTF of Co interconnect with the additional heat dissipation by V2 insertion is ~5.65X of W/Cu interconnect.
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考虑频率相关热时间常数、三维热流、边界/合金散射和界面热阻的布局柔性finfet和BEOL的综合热SPICE建模与电路级可靠性评估
为了提供比两个τc模型和一个τc模型更精确的交流自热(SH)结果,提出了基于分布式Rth-Cth网络的热SPICE模型。在finfet中热点(τhotspot)的热时间常数是频率相关的,而不是常数。我们的SPICE中包含了由边界/合金散射和界面热阻(ITR)引起的严重SH。翅片、金属和imd的模块化组件提供了设备和路由的灵活性,无需额外的FEM模拟。采用AMM模型计算Si80Ge20/Si1-xGex的ITR作为SiGe finfet的下界。由于Co的低导热性,Co互连(5X)的固有电迁移(EM)改善被增加的Tmetal抵消(5X→2.44X)。建议在环形振荡器(RO)的电源线上放置不同的V2以降低Tj (FinFET)和Tmetal。Co互连的emmttf预测值为W/Cu互连的5.65倍。
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