Ultrahigh-Sensitive and CMOS Compatible ISFET Developed in BEOL of Industrial UTBB FDSOI

G. Ayele, S. Monfray, S. Ecoffey, F. Boeuf, R. Bon, J. Cloarec, D. Drouin, A. Souifi
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引用次数: 5

Abstract

The industrialization of ion-sensitive field-effect transistors (ISFETs) has been constrained due mainly to the limited sensitivity, and inclusion of bulky reference electrode. With this paper, we report an ultrahigh-sensitive and CMOS compatible ISFET in which the need for the reference electrode is eliminated. Based on an industrial UTBB FDSOI device in BEOL, we obtained an ultrahigh sensitivity of 730 mV/pH which is 12-times higher than the Nernst limit. Integrating the sensing area and the control gate in the BEOL of UTBB FDSOI transistors with a capacitive divider circuit, and using the back biasing feature of such devices, we could eliminate the necessity of the reference electrode making our sensor highly scalable and ideal for the IoT. This is the first demonstration of an integrated pH sensor in the BEOL of FDSOI platform. The measurements on fabricated sensors have also been validated by modeling and simulation.
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在工业UTBB FDSOI的BEOL中开发了超高灵敏度和CMOS兼容的ISFET
离子敏感场效应晶体管(isfet)的工业化一直受到其灵敏度有限和参比电极体积庞大等问题的制约。在本文中,我们报告了一种超高灵敏度和CMOS兼容的ISFET,其中消除了对参比电极的需要。基于BEOL的工业UTBB FDSOI器件,我们获得了730 mV/pH的超高灵敏度,比Nernst极限高12倍。通过电容分压器电路将UTBB FDSOI晶体管BEOL中的传感区域和控制门集成,并利用该器件的背偏置特性,我们可以消除参考电极的必要性,使我们的传感器具有高度可扩展性,是物联网的理想选择。这是FDSOI平台BEOL中集成pH传感器的首次演示。通过建模和仿真验证了所制备传感器的测量结果。
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