Structural Enhancement for a CMOS-MEMS Microphone Under Thermal Loading by Taguchi Method

Chun-Lin Lu, M. Yeh
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Abstract

Structural optimization is a necessary procedure to make progress toward mass production for a new device. Both of structural robustness and superior performance are targets for structural optimization. In this study the structural weakness of a complementary metal oxide semiconductor (CMOS) - microelectromechanical systems (MEMS) microphone chip with 4 by 3 microphone cells by TSMC 0.18 µm CMOS process during thermal loading was identified first by thermal cycling test and thermal stress analysis; then, the optimal structures of the microphone were discussed from viewpoints of thermal stress and sensitivity by Taguchi method. Therein, the finite element (FE) method was adopted for thermal stress analysis and capacitive sensitivity of the microphone was obtained from the equation of sensing capacitance. Moreover, the weakness spots at bottom of the diaphragm in the microphone chip from simulation were verified by the images of scanning electron microscope (SEM) for the chip after 500 cycles of thermal loading in experiment. The results of structural optimization by Taguchi method showed that the microphone with thicker metal and thinner SiO2, wider anchor, and larger diaphragm could reduce the thermal stress in the diaphragm up to 68% than that of the original design. However, for the capacitive sensitivity of microphone chip, the results indicated that the microphone with thicker metal and SiO2, narrower anchor, and larger diaphragm had 5.8 times increase of microphone capacitive sensitivity than that of the original design. This study could provide helpful suggestions for the design and structural robustness of MEMS microphone.
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基于田口法的CMOS-MEMS传声器热负载结构增强
结构优化是新器件实现量产的必要步骤。结构的鲁棒性和优越的性能都是结构优化的目标。本研究首先通过热循环测试和热应力分析,确定了采用TSMC 0.18µm CMOS工艺的4 × 3麦克风单元的互补金属氧化物半导体(CMOS) -微机电系统(MEMS)麦克风芯片在热加载过程中的结构缺陷;然后,采用田口法从热应力和灵敏度的角度对传声器的优化结构进行了讨论。其中,采用有限元法对传声器进行热应力分析,由感应电容方程得到传声器的电容灵敏度。通过实验中500次热加载后芯片的扫描电镜图像,验证了模拟得到的传声器芯片中膜片底部的弱点。通过Taguchi方法进行结构优化的结果表明,采用更厚的金属和更薄的SiO2、更宽的锚点和更大的膜片,可以使膜片内的热应力比原设计降低68%。然而,对于传声器芯片的电容灵敏度,结果表明,金属和SiO2厚度更厚、锚点更窄、膜片尺寸更大的传声器的电容灵敏度比原设计提高了5.8倍。本研究可为MEMS传声器的设计和结构稳健性提供有益的建议。
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