{"title":"Ultra low power design and future device interactions","authors":"A. Amerasekera, C. Bittlestone","doi":"10.1109/IEDM.2012.6478972","DOIUrl":null,"url":null,"abstract":"We present the interactions between the process technology and the design that set the requirements for ultra low power and mixed signal circuits and chips that form the basis of the next generations of semiconductor applications.","PeriodicalId":6376,"journal":{"name":"2012 International Electron Devices Meeting","volume":"4 1","pages":"3.4.1-3.4.4"},"PeriodicalIF":0.0000,"publicationDate":"2012-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.2012.6478972","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We present the interactions between the process technology and the design that set the requirements for ultra low power and mixed signal circuits and chips that form the basis of the next generations of semiconductor applications.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
