A critical analysis of the determination of the density of defects in a-Si/sub 1-x/Ge/sub x/ alloys with the PDS technique

D. Della Sala, C. Reita, G. Conte, F. Galluzzi, G. Grillo
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Abstract

The application of PDS (photothermal deflection spectroscopy) to the counting of defect states is complicated in a-Ge/sub x/Si/sub 1-x/ by the coexistence of two types of dangling bonds and their unknown energetic position in the forbidden energy gap. Using a model density of states, the authors conclude that it is intrinsically impossible to distinguish between Si and Ge dangling bonds. In addition, despite the fact that the density of bulk defects can be evaluated successfully, it is suggested that there is always a spurious absorption due to surface states. The measured density of dangling bonds keeps increasing from pure a-Si:H (N/sub d/ equivalent to 2*10/sup 16/ cm/sup -3/) to pure a-Ge:H (N/sub d/ equivalent to 5*10/sup 17/ cm/sup -3/), and this is shown to be a material property.<>
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PDS技术测定A - si /sub - 1-x/Ge/sub -x/合金缺陷密度的关键分析
在a-Ge/sub x/Si/sub 1-x/中,由于两种悬空键的共存以及它们在禁能隙中的未知能量位置,使得PDS(光热偏转光谱)在缺陷态计数中的应用变得复杂。使用模型态密度,作者得出结论,从本质上讲,不可能区分Si和Ge悬空键。此外,尽管可以成功地评估体缺陷的密度,但由于表面状态的原因,总是存在虚假吸收。悬空键的测量密度从纯a- si:H (N/sub d/相当于2*10/sup 16/ cm/sup -3/)到纯a- ge:H (N/sub d/相当于5*10/sup 17/ cm/sup -3/)不断增加,这是一种材料性质。
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