Daeyeon Kim, J. Wiedemer, P. Kolar, Ayushi Shrivastava, Jinal Shah, Satyanand Nalam, Gwanghyeon Baek, Xiaofei Wang, Z. Guo, E. Karl
{"title":"Sub-550mV SRAM Design in 22nm FinFET Low Power (22FFL) Technology with Self-Induced Collapse Write Assist","authors":"Daeyeon Kim, J. Wiedemer, P. Kolar, Ayushi Shrivastava, Jinal Shah, Satyanand Nalam, Gwanghyeon Baek, Xiaofei Wang, Z. Guo, E. Karl","doi":"10.1109/VLSIT.2018.8510704","DOIUrl":null,"url":null,"abstract":"Exceptionally low minimum operating voltage (V<inf>MIN</inf>) SRAM arrays have been demonstrated on 22nm FinFET low power technology (22FFL) [1]. By optimizing an undoped SRAM transistor and applying industry standard write assist techniques, 16Mb array of 0.087μm<sup>2</sup> high-density bitcell (HDC) and 32Mb array of 0.107μm<sup>2</sup> high-current bitcell (HCC) achieve the 95<sup>th</sup> percentile V<inf>MIN</inf> of 505mV and 450mV respectively across a temperature range of -10°C to 95°C. A self-induced collapse (SIC) write assist integrated into the 6-T HDC SRAM bitcell array enables 110mV V<inf>MIN</inf> reduction relative to an unassisted array at the 95<sup>th</sup> percentile with negligible power overhead.","PeriodicalId":6561,"journal":{"name":"2018 IEEE Symposium on VLSI Technology","volume":"2 1","pages":"151-152"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2018.8510704","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
Exceptionally low minimum operating voltage (VMIN) SRAM arrays have been demonstrated on 22nm FinFET low power technology (22FFL) [1]. By optimizing an undoped SRAM transistor and applying industry standard write assist techniques, 16Mb array of 0.087μm2 high-density bitcell (HDC) and 32Mb array of 0.107μm2 high-current bitcell (HCC) achieve the 95th percentile VMIN of 505mV and 450mV respectively across a temperature range of -10°C to 95°C. A self-induced collapse (SIC) write assist integrated into the 6-T HDC SRAM bitcell array enables 110mV VMIN reduction relative to an unassisted array at the 95th percentile with negligible power overhead.