Experimental evaluation of carrier transport and device design for planar symmetric/asymmetric double-gate/ground-plane CMOSFETs

M. Ieong, E. C. Jones, T. Kanarsky, Zhibin Ren, Omer Dokumaci, Ronnen, Roy, Leathen Shi, SToshiharu Furukawa, Yuan Taw, Robert J. Miller, Philip Wong
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引用次数: 45

Abstract

Demonstrated double-gate devices with excellent drive current and short-channel-effect control. The double-gate devices exhibit ideal linear, sub-threshold slope of 60 mV/dec and better than ideal saturated sub-threshold slope of 55 mV/dec. The effective mobility in all device structures follows the universal mobility curve. The symmetric double-gate offers 20% mobility enhancement over a GP device at 1.0 V gate over-drive. Because the double-gate can be operated at a much lower effective-field, substantial mobility enhancement (>2X) over scaled bulk CMOS can be achieved. For the first time, DC operation of double-gate CMOS inverters are demonstrated down to Vdd=0.3 V.
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平面对称/非对称双栅/地平面cmosfet载流子输运及器件设计的实验评估
演示了具有优异驱动电流和短通道效应控制的双栅极器件。双栅器件表现出60 mV/dec的理想线性亚阈值斜率,优于55 mV/dec的理想饱和亚阈值斜率。所有器件结构的有效迁移率都遵循通用迁移率曲线。对称双栅极在1.0 V栅极超驱动下比GP器件提供20%的迁移率增强。由于双栅极可以在更低的有效场下工作,因此可以实现比规模CMOS大幅提高迁移率(>2X)。首次证明了双栅CMOS逆变器的直流工作电压低至Vdd=0.3 V。
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