A. Alian, S. E. Kazzi, A. Verhulst, A. Milenin, N. Pinna, T. Ivanov, D. Lin, D. Mocuta, N. Collaert
{"title":"Record 47 mV/dec top-down vertical nanowire InGaAs/GaAsSb tunnel FETs","authors":"A. Alian, S. E. Kazzi, A. Verhulst, A. Milenin, N. Pinna, T. Ivanov, D. Lin, D. Mocuta, N. Collaert","doi":"10.1109/VLSIT.2018.8510619","DOIUrl":null,"url":null,"abstract":"Pocketed vertical nanowire InGaAs/GaAsSb tunnel FETs (TFET) with sub-threshold swing (SS) reaching 47 mV/dec are demonstrated. The achieved sub-threshold performance is the steepest reported so far for a top-down TFET in the III-V material system. Smooth vertical wires with diameters as narrow as 30 nm are achieved using a CH4 based dry etch process. Drive current at 0.35 V supply voltage approaches 0.7 μA/μm for a fixed Ioff of 1 nA/μm.","PeriodicalId":6561,"journal":{"name":"2018 IEEE Symposium on VLSI Technology","volume":"34 1","pages":"133-134"},"PeriodicalIF":0.0000,"publicationDate":"2018-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2018 IEEE Symposium on VLSI Technology","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSIT.2018.8510619","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10
Abstract
Pocketed vertical nanowire InGaAs/GaAsSb tunnel FETs (TFET) with sub-threshold swing (SS) reaching 47 mV/dec are demonstrated. The achieved sub-threshold performance is the steepest reported so far for a top-down TFET in the III-V material system. Smooth vertical wires with diameters as narrow as 30 nm are achieved using a CH4 based dry etch process. Drive current at 0.35 V supply voltage approaches 0.7 μA/μm for a fixed Ioff of 1 nA/μm.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
