Cu-Cu Bonding by Low-Temperature Sintering of Self-Healable Cu Nanoparticles

Junjie Li, Qi Liang, Chen Chen, T. Shi, G. Liao, Zirong Tang
{"title":"Cu-Cu Bonding by Low-Temperature Sintering of Self-Healable Cu Nanoparticles","authors":"Junjie Li, Qi Liang, Chen Chen, T. Shi, G. Liao, Zirong Tang","doi":"10.1109/ECTC.2019.00105","DOIUrl":null,"url":null,"abstract":"The Cu-Cu bonding temperature by using Cu nanoparticles is mainly influenced by the size and the purity of Cu nanoparticles. To remove the oxides of Cu, reducing atmosphere is always introduced into the sintering and bonding process. In this paper, a new Cu-Cu bonding method by sintering of self-healable Cu nanoparticles was proposed. With this method, the surface oxidation layer of Cu nanoparticle can be removed without reducing atmosphere at sintering and bonding process. In order to research the self-healing properties of the surface oxidized Cu nanoparticles, the sintering and bonding experiments were carried out under an Ar atmosphere. With self-healable Cu nanoparticles, the electrical resistivity of sintered Cu film can be reduced to lower than 5 µΩ·cm after sintering, and a high shear strength Cu-Cu joint over 25 MPa can be achieved after bonding at 250 °C. The oxygen content was also significantly reduced during the sintering and bonding process, which reflected the excellent self-healing property of Cu nanoparticle paste. The high Cu-Cu bonding strength and no requirement for reducing atmosphere indicate that the proposed self-healable Cu nanoparticle paste is promising to be wildly used in advanced electronics packaging.","PeriodicalId":6726,"journal":{"name":"2019 IEEE 69th Electronic Components and Technology Conference (ECTC)","volume":"65 1","pages":"661-666"},"PeriodicalIF":0.0000,"publicationDate":"2019-05-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 IEEE 69th Electronic Components and Technology Conference (ECTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTC.2019.00105","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 5

Abstract

The Cu-Cu bonding temperature by using Cu nanoparticles is mainly influenced by the size and the purity of Cu nanoparticles. To remove the oxides of Cu, reducing atmosphere is always introduced into the sintering and bonding process. In this paper, a new Cu-Cu bonding method by sintering of self-healable Cu nanoparticles was proposed. With this method, the surface oxidation layer of Cu nanoparticle can be removed without reducing atmosphere at sintering and bonding process. In order to research the self-healing properties of the surface oxidized Cu nanoparticles, the sintering and bonding experiments were carried out under an Ar atmosphere. With self-healable Cu nanoparticles, the electrical resistivity of sintered Cu film can be reduced to lower than 5 µΩ·cm after sintering, and a high shear strength Cu-Cu joint over 25 MPa can be achieved after bonding at 250 °C. The oxygen content was also significantly reduced during the sintering and bonding process, which reflected the excellent self-healing property of Cu nanoparticle paste. The high Cu-Cu bonding strength and no requirement for reducing atmosphere indicate that the proposed self-healable Cu nanoparticle paste is promising to be wildly used in advanced electronics packaging.
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低温烧结自愈纳米铜的Cu-Cu键合研究
纳米铜颗粒的大小和纯度是影响Cu-Cu键合温度的主要因素。为了去除铜的氧化物,在烧结和粘合过程中总是引入还原性气氛。本文提出了一种烧结自愈纳米铜的Cu-Cu键合新方法。该方法可以在烧结和键合过程中不需要还原气氛的情况下去除Cu纳米颗粒表面氧化层。为了研究表面氧化铜纳米粒子的自愈性能,在氩气气氛下进行了烧结和键合实验。采用自愈性Cu纳米粒子,烧结后Cu膜的电阻率可降至5µΩ·cm以下,在250℃下结合后可获得25 MPa以上的高剪切强度Cu-Cu接头。在烧结和键合过程中,氧含量也显著降低,这反映了纳米铜颗粒膏体良好的自愈性能。高的Cu-Cu键合强度和不需要还原气氛,表明所提出的自修复纳米Cu颗粒浆料在先进电子封装中有广泛的应用前景。
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