{"title":"从毫秒到纳秒退火:挑战和新方法","authors":"Y. Wang, Shaoyin Chen, M. Shen, Xiaoru Wang","doi":"10.1109/IWJT.2016.7486662","DOIUrl":null,"url":null,"abstract":"Nanosecond (nsec) melt annealing offers unique capabilities such as ultra low thermal budget, high dopant activation and super abruption junctions. But process integration is more difficult than millisecond (msec) annealing due to two orders of magnitude smaller heat diffusion length. In this paper, we will discuss some of the key challenges, and propose a new approach that combines the benefits of both msec and nsec annealing.","PeriodicalId":117665,"journal":{"name":"2016 16th International Workshop on Junction Technology (IWJT)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-05-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"From millisecond to nanosecond annealing: Challenges and new approach\",\"authors\":\"Y. Wang, Shaoyin Chen, M. Shen, Xiaoru Wang\",\"doi\":\"10.1109/IWJT.2016.7486662\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Nanosecond (nsec) melt annealing offers unique capabilities such as ultra low thermal budget, high dopant activation and super abruption junctions. But process integration is more difficult than millisecond (msec) annealing due to two orders of magnitude smaller heat diffusion length. In this paper, we will discuss some of the key challenges, and propose a new approach that combines the benefits of both msec and nsec annealing.\",\"PeriodicalId\":117665,\"journal\":{\"name\":\"2016 16th International Workshop on Junction Technology (IWJT)\",\"volume\":\"3 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-05-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 16th International Workshop on Junction Technology (IWJT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IWJT.2016.7486662\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 16th International Workshop on Junction Technology (IWJT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IWJT.2016.7486662","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
From millisecond to nanosecond annealing: Challenges and new approach
Nanosecond (nsec) melt annealing offers unique capabilities such as ultra low thermal budget, high dopant activation and super abruption junctions. But process integration is more difficult than millisecond (msec) annealing due to two orders of magnitude smaller heat diffusion length. In this paper, we will discuss some of the key challenges, and propose a new approach that combines the benefits of both msec and nsec annealing.