电阻式随机存取存储器的瞬态控制,具有高速和高持久性能

Weijie Wang, Hongxin Yang, V. Y. Zhuo, Minghua Li, E. Chua, Yu Jiang
{"title":"电阻式随机存取存储器的瞬态控制,具有高速和高持久性能","authors":"Weijie Wang, Hongxin Yang, V. Y. Zhuo, Minghua Li, E. Chua, Yu Jiang","doi":"10.1109/VLSI-TSA.2016.7480502","DOIUrl":null,"url":null,"abstract":"Of all the advantages exhibited by the RRAM devices, e.g. low power consumption, fast switching speed, and especially the good scalability are particularly striking for high density memory application. However, 3D RRAM still suffer from poor endurance especially during high speed operation which limits its extensive applications. Here, we report the transient control method which enables a significant improvement of device stability and endurance. We demonstrated the stable transient control under the fast pulse switching in RRAM cells with different sizes of 1 μm and 200 nm. Endurance higher than 107 cycles are achieved while keeping the ratio of high/low resistance level at 103. High speed switching with 1 ns pulse width can be achieved. We unveil the material switching dynamics responsible for the stable transient process, which is responsible for the higher endurance for RRAM devices.","PeriodicalId":441941,"journal":{"name":"2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","volume":"275 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2016-04-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Transient control of resistive random access memory for high speed and high endurance performance\",\"authors\":\"Weijie Wang, Hongxin Yang, V. Y. Zhuo, Minghua Li, E. Chua, Yu Jiang\",\"doi\":\"10.1109/VLSI-TSA.2016.7480502\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Of all the advantages exhibited by the RRAM devices, e.g. low power consumption, fast switching speed, and especially the good scalability are particularly striking for high density memory application. However, 3D RRAM still suffer from poor endurance especially during high speed operation which limits its extensive applications. Here, we report the transient control method which enables a significant improvement of device stability and endurance. We demonstrated the stable transient control under the fast pulse switching in RRAM cells with different sizes of 1 μm and 200 nm. Endurance higher than 107 cycles are achieved while keeping the ratio of high/low resistance level at 103. High speed switching with 1 ns pulse width can be achieved. We unveil the material switching dynamics responsible for the stable transient process, which is responsible for the higher endurance for RRAM devices.\",\"PeriodicalId\":441941,\"journal\":{\"name\":\"2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)\",\"volume\":\"275 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2016-04-25\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/VLSI-TSA.2016.7480502\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2016 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/VLSI-TSA.2016.7480502","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

RRAM器件具有功耗低、开关速度快、可扩展性好等优点,在高密度存储应用中表现得尤为突出。然而,3D RRAM在高速运行时的耐久性仍然较差,限制了其广泛应用。在这里,我们报告的暂态控制方法,使设备的稳定性和耐用性显著提高。在不同尺寸(1 μm和200 nm)的RRAM电池中,我们展示了在快速脉冲开关下的稳定瞬态控制。在保持高/低阻力水平比为103的情况下,获得了高于107个循环的耐力。可以实现1 ns脉宽的高速开关。我们揭示了稳定瞬态过程的材料切换动力学,这是RRAM器件更高耐用性的原因。
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Transient control of resistive random access memory for high speed and high endurance performance
Of all the advantages exhibited by the RRAM devices, e.g. low power consumption, fast switching speed, and especially the good scalability are particularly striking for high density memory application. However, 3D RRAM still suffer from poor endurance especially during high speed operation which limits its extensive applications. Here, we report the transient control method which enables a significant improvement of device stability and endurance. We demonstrated the stable transient control under the fast pulse switching in RRAM cells with different sizes of 1 μm and 200 nm. Endurance higher than 107 cycles are achieved while keeping the ratio of high/low resistance level at 103. High speed switching with 1 ns pulse width can be achieved. We unveil the material switching dynamics responsible for the stable transient process, which is responsible for the higher endurance for RRAM devices.
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