电应力作用下氮化镓基深紫外发光二极管缺陷的演变

Yingzhe Wang, Xuefeng Zheng, Jiaduo Zhu, Shengrui Xu, Xiao-hua Ma, Jincheng Zhang, Y. Hao, Linlin Xu, J. Dai, Peixian Li
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引用次数: 0

摘要

本研究深入研究了电应力诱导的algan基深紫外发光二极管在降解过程中的缺陷演变。光功率的降低和泄漏电流的增加与从深能级瞬态光谱(deep level transient spectroscopy, dts)测量中提取的能级在0.25 ~ 0.38 eV范围内的新电子阱B直接相关。PL光谱中“黄”带峰明显增加,DLTS信号与脉宽呈线性关系,表明缺陷B对应于位错方向的Ga空位。Ga空位的增加伴随着能级为0.29 ~ 0.34 eV的空穴阱a的减小。结合第一性原理计算和实验结果,证明了Ga空位的产生源于mg相关缺陷沿位错方向的变化。
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Evolution of Defect in AlGaN-based Deep Ultraviolet Light Emitting Diodes During Electrical Stress
This work provides an intensive investigation of defect evolution in the degradation process induced by electrical stress of AlGaN-based deep ultraviolet light emitting diodes. The reduced optical power and the increased leakage current are directly related to a new generated electron trap B with an energy level in the range of 0.25-0.38 eV, which is extracted from deep level transient spectroscopy (DLTS) measurement. The significantly increased "yellow" band peak in PL spectra and the linear relation between DLTS signal and pulse width indicate that, defect B corresponds to Ga vacancy along dislocation. The increase of Ga vacancy is accompanied with a decrease of hole trap A with energy level of 0.29-0.34 eV. Combining with first-principle calculation and experimental results, it is demonstrated that the generation of Ga vacancy is originated from the variation in Mg-related defect along dislocation.
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