Dongyoung Kim, Adam J. Morgan, Nick Yun, Woongje Sung, A. Agarwal, R. Kaplar
{"title":"非等温模拟优化SiC mosfet以增强短路稳健性","authors":"Dongyoung Kim, Adam J. Morgan, Nick Yun, Woongje Sung, A. Agarwal, R. Kaplar","doi":"10.1109/IRPS45951.2020.9128324","DOIUrl":null,"url":null,"abstract":"Non-Isothermal simulations to understand Short-Circuit (SC) behavior of SiC MOSFETs were performed. Using the established model, structures to enhance the SC ruggedness were proposed. Thin gate oxide and a narrow JFET region are shown to reduce saturation current enhancing SC ruggedness without increasing Ron,sp. Results indicate thin gate oxide offers moderate improvement in SC capability, at the cost of increased Cgs. In contrast, narrow JFET region provides much improved (2×) SC ruggedness, as well as lower Ron,sp, with no negative impact on Cgs.","PeriodicalId":116002,"journal":{"name":"2020 IEEE International Reliability Physics Symposium (IRPS)","volume":"56 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2020-04-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Non-Isothermal Simulations to Optimize SiC MOSFETs for Enhanced Short-Circuit Ruggedness\",\"authors\":\"Dongyoung Kim, Adam J. Morgan, Nick Yun, Woongje Sung, A. Agarwal, R. Kaplar\",\"doi\":\"10.1109/IRPS45951.2020.9128324\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Non-Isothermal simulations to understand Short-Circuit (SC) behavior of SiC MOSFETs were performed. Using the established model, structures to enhance the SC ruggedness were proposed. Thin gate oxide and a narrow JFET region are shown to reduce saturation current enhancing SC ruggedness without increasing Ron,sp. Results indicate thin gate oxide offers moderate improvement in SC capability, at the cost of increased Cgs. In contrast, narrow JFET region provides much improved (2×) SC ruggedness, as well as lower Ron,sp, with no negative impact on Cgs.\",\"PeriodicalId\":116002,\"journal\":{\"name\":\"2020 IEEE International Reliability Physics Symposium (IRPS)\",\"volume\":\"56 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-04-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 IEEE International Reliability Physics Symposium (IRPS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IRPS45951.2020.9128324\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE International Reliability Physics Symposium (IRPS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IRPS45951.2020.9128324","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Non-Isothermal Simulations to Optimize SiC MOSFETs for Enhanced Short-Circuit Ruggedness
Non-Isothermal simulations to understand Short-Circuit (SC) behavior of SiC MOSFETs were performed. Using the established model, structures to enhance the SC ruggedness were proposed. Thin gate oxide and a narrow JFET region are shown to reduce saturation current enhancing SC ruggedness without increasing Ron,sp. Results indicate thin gate oxide offers moderate improvement in SC capability, at the cost of increased Cgs. In contrast, narrow JFET region provides much improved (2×) SC ruggedness, as well as lower Ron,sp, with no negative impact on Cgs.