II型砷化镓/砷化铝多量子阱结构中光激发电子的层间输运

P. Saeta, R. Fischer, B. Greene, R. Spitzer, B. A. Wilson
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摘要

在块体GaAs和传统I型GaAs/GaAlAs多量子阱结构(MQWS)上进行的光泵探针实验已经确定了光激发载流子(1)在它们之间达到热平衡的时间尺度,(2)从区域中心Γ-valley散射到可到达的X或l谷,(3)将它们多余的能量放松到晶格,以及(4)重新组合。(1-3)在大多数情况下,载流子热化(通过载流子-载流子碰撞)和谷间散射发生在不到100 fs。晶格加热以皮秒为单位,重组以纳秒到微秒甚至更长时间为单位。在这些直接间隙系统中,光激发的电子和空穴保持在晶体的同一层或区域。在II型结构中,最高价带出现在一层,最低导带出现在另一层;受激载流子在空间上分离,一个载流子留在较窄的带隙材料中,另一个载流子转移到相邻层中发生的较低能态。我们已经确定,在具有8层GaAs单层和25层AlAs单层交替的II型GaAs/AIAs MQWS中,光激发电子在100 fs内从GaAs层的Γ-valley转移到相邻AlAs层的x谷。
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Interlayer Transport of Photoexcited Electrons in Type II Gallium-Arsenide/Aluminum-Arsenide Multi-Quantum Well Structures
Optical pump-probe experiments on bulk GaAs and conventional type I GaAs/GaAlAs multi­quantum well structures (MQWS) have determined the time scales on which photoexcited carriers (1) attain thermal equilibrium among themselves, (2) scatter out of the zone-center Γ-valley to accessible X- or L-valleys, (3) relax their excess energy to the lattice, and (4) recombine.(1-3) In most cases, carrier thermalization (via carrier-carrier collisions) and intervalley scattering occur in less than 100 fs, lattice heating in picoseconds, and recombination in nanoseconds to microseconds and longer. In these direct gap systems, photoexcited electrons and holes remain in the same layer or region of the crystal. In type II structures, the highest valence band occurs in one layer and the lowest conduction band in the other; excited carriers spatially segregate, one carrier remaining in the narrower bandgap material, the other transferring to the lower energy states occurring in the adjacent layer. We have determined that in a type II GaAs/AIAs MQWS having 8 monolayers of GaAs alternating with 25 monolayers of AlAs photoexcited electrons transfer from the Γ-valley of the GaAs layers to the X-valley of adjacent AlAs layers within 100 fs.
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