SOI单电子晶体管

Xiaohui Tang, X. Baie, V. Bayot, F. van de Wiele, J. Colinge
{"title":"SOI单电子晶体管","authors":"Xiaohui Tang, X. Baie, V. Bayot, F. van de Wiele, J. Colinge","doi":"10.1109/SOI.1999.819851","DOIUrl":null,"url":null,"abstract":"Single-electron transistors (SETs) are currently being investigated by many research groups as possible devices for ultra-high-density, low-power information processing or storage systems. A single-electron transistor consists of two tunnel junctions (TJ) connected to the source and the drain, a center floating node and a capacitance connected to the device gate. It takes a finite minimum source-to center node bias to inject an electron into the node by tunneling. This effect is called Coulomb blockade. In this paper, SET devices were fabricated using thin-silicon (100 nm) Unibond/sup (R)/ wafers and e-beam lithography, and were found to exhibit the Coulomb blockade effects predicted by theory.","PeriodicalId":117832,"journal":{"name":"1999 IEEE International SOI Conference. Proceedings (Cat. No.99CH36345)","volume":"198 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1999-10-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"6","resultStr":"{\"title\":\"An SOI single-electron transistor\",\"authors\":\"Xiaohui Tang, X. Baie, V. Bayot, F. van de Wiele, J. Colinge\",\"doi\":\"10.1109/SOI.1999.819851\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Single-electron transistors (SETs) are currently being investigated by many research groups as possible devices for ultra-high-density, low-power information processing or storage systems. A single-electron transistor consists of two tunnel junctions (TJ) connected to the source and the drain, a center floating node and a capacitance connected to the device gate. It takes a finite minimum source-to center node bias to inject an electron into the node by tunneling. This effect is called Coulomb blockade. In this paper, SET devices were fabricated using thin-silicon (100 nm) Unibond/sup (R)/ wafers and e-beam lithography, and were found to exhibit the Coulomb blockade effects predicted by theory.\",\"PeriodicalId\":117832,\"journal\":{\"name\":\"1999 IEEE International SOI Conference. Proceedings (Cat. No.99CH36345)\",\"volume\":\"198 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1999-10-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"6\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1999 IEEE International SOI Conference. Proceedings (Cat. No.99CH36345)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SOI.1999.819851\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1999 IEEE International SOI Conference. Proceedings (Cat. No.99CH36345)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SOI.1999.819851","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 6

摘要

目前,许多研究小组正在研究单电子晶体管(set)作为超高密度、低功耗信息处理或存储系统的可能器件。单电子晶体管由两个连接源极和漏极的隧道结(TJ)、一个中心浮动节点和一个连接器件栅极的电容组成。它需要一个有限的最小源-中心节点偏置,才能通过隧穿将电子注入节点。这种效应被称为库仑封锁。本文采用薄硅(100 nm) Unibond/sup (R)/晶圆和电子束光刻技术制备了SET器件,并发现其具有理论预测的库仑封锁效应。
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An SOI single-electron transistor
Single-electron transistors (SETs) are currently being investigated by many research groups as possible devices for ultra-high-density, low-power information processing or storage systems. A single-electron transistor consists of two tunnel junctions (TJ) connected to the source and the drain, a center floating node and a capacitance connected to the device gate. It takes a finite minimum source-to center node bias to inject an electron into the node by tunneling. This effect is called Coulomb blockade. In this paper, SET devices were fabricated using thin-silicon (100 nm) Unibond/sup (R)/ wafers and e-beam lithography, and were found to exhibit the Coulomb blockade effects predicted by theory.
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