新颖的微纹理薄膜为3D设备的通用处理提供了希望

R. Varma, Jennifer Dossee Nunes
{"title":"新颖的微纹理薄膜为3D设备的通用处理提供了希望","authors":"R. Varma, Jennifer Dossee Nunes","doi":"10.1109/asmc54647.2022.9792493","DOIUrl":null,"url":null,"abstract":"This paper will discuss the challenges associated with the constant evolution of IC device dimensions, and the need for carriers that can adapt quickly to the change in form factor but still maintain JEDEC standards for compatibility with existing equipment sets and pick & place tools. The paper will present a new technology inspired by gecko fibril microstructures with reversible adhesion that offers a unique approach to device handling.","PeriodicalId":436890,"journal":{"name":"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","volume":"175 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-05-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Novel Micro-Textured Film Offers Promise in Universal Handling of 3D Devices\",\"authors\":\"R. Varma, Jennifer Dossee Nunes\",\"doi\":\"10.1109/asmc54647.2022.9792493\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper will discuss the challenges associated with the constant evolution of IC device dimensions, and the need for carriers that can adapt quickly to the change in form factor but still maintain JEDEC standards for compatibility with existing equipment sets and pick & place tools. The paper will present a new technology inspired by gecko fibril microstructures with reversible adhesion that offers a unique approach to device handling.\",\"PeriodicalId\":436890,\"journal\":{\"name\":\"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"volume\":\"175 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-05-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/asmc54647.2022.9792493\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/asmc54647.2022.9792493","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

本文将讨论与IC器件尺寸不断发展相关的挑战,以及对运营商的需求,这些运营商可以快速适应形状因素的变化,但仍然保持JEDEC标准,以与现有设备集和拾取&放置工具兼容。本文将介绍一种受壁虎纤维微结构启发的新技术,具有可逆粘附性,为设备处理提供了一种独特的方法。
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Novel Micro-Textured Film Offers Promise in Universal Handling of 3D Devices
This paper will discuss the challenges associated with the constant evolution of IC device dimensions, and the need for carriers that can adapt quickly to the change in form factor but still maintain JEDEC standards for compatibility with existing equipment sets and pick & place tools. The paper will present a new technology inspired by gecko fibril microstructures with reversible adhesion that offers a unique approach to device handling.
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