pGeSn/nGe二极管的电学特性

B. Baert, Somya Gupta, F. Gencarelli, R. Loo, E. Simoen, N. D. Nguyen
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摘要

已经测量了pGeSn/nGe二极管的I-V特性,并显示出非常有趣的特性。对相同结构的模拟能够再现大多数观察到的行为,并指出诸如GeSn层的带隙能量等参数的主要影响。C-V特性显示出很少的频率依赖性也被测量,并通过模拟证实了他们对载流子浓度测定的分析。为了解释一些观察到的行为,特别是反向饱和电流,仍然需要对温度、C-V特性中其他观察到的特征以及界面或两层中大部分的其他缺陷的影响进行更多的研究。
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Electrical characterization of pGeSn/nGe diodes
I-V characteristics of pGeSn/nGe diodes have been measured and show very interesting properties. Simulations of the same structure are able to reproduce most of the observed behavior and point to the predominant influence of parameters such as the band gap energy of the GeSn layer. C-V characteristics showing little frequency dependence have also been measured, and their analysis for the determination of the carrier concentration is confirmed by simulations. More investigations of the effect of temperature, of other observed features in the C-V characteristics and of other defects at the interface or in the bulk of either layers, are still required in order to explain some of the observed behaviors, notably the reverse saturation current.
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