少层iii-vi材料中环形价带对场效应效应的影响

Protik Das, G. Yin, S. Sylvia, Khairul Alamt, D. Wickramaratne, R. Lake
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摘要

墨西哥帽状分散体在少量层状二维材料中相对常见。在一到四层的病态硫族化合物(GaS, GaSe, InS, InSe)中,价带经历了从抛物线到墨西哥帽色散[1]的能带反转。这种墨西哥帽色散导致带边缘的态密度出现奇点。这提高了热电性能,但对场效应晶体管性能的影响尚未研究。为了评估这种环形色散对场效应管性能的影响,我们使用了势垒场效应管模型的顶部。模拟器件的物理栅长、有效氧化层厚度和电源电压分别为12.8 nm、0.68nm和0.3V,符合Nikonov和Young[2]描述的低压参数。仿真装置如图1所示。为了模拟沿着器件通道的静电势,我们在模拟域上求解了一个二维泊松方程。根据文献[1]中描述的墨西哥帽色散计算的态密度和模态密度分别如图2和图3所示。模态密度作为电流计算的输入。采用Nikonov和Young[2]定义的15nm节点低压标准对器件的性能特征进行基准测试,并与其他器件进行比较。
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The impact of the ring shaped valence band in few-layer iii-vi materials on fet operation
Mexican hat shaped dispersions are relatively common in few-layered two-dimensional materials. In one to four monolayers of the group-ill chalcogenides (GaS, GaSe, InS, InSe) the valence band undergoes a band inversion from parabolic to a Mexican hat dispersion [1]. This Mexican hat dispersion results in a singularity in the density of states at the band edge. This enhances the thermo electric properties, however the effect on field effect transistor performance has not yet been investigated. To evaluate the impact of this ring shaped disperision on FET performance, we use a top of the barrier FET model. The physical gate length, effective oxide thickness and power supply voltage for the simulated devices are 12.8 nm, 0.68nm, and 0.3V respectively, following the low-voltage parameters described by Nikonov and Young [2]. The simulated device is shown in Fig. 1. To model the electrostatic potential along the channel of the device we solve a 2-D Poisson equation over the simulation domain. The density of states and density of modes calculated from the Mexican hat dispersion described in Ref. [I] are shown in Figs. 2 and 3, respectively. The density of modes is used as input for the current calculation. The performance characteristics of the devices are benchmarked using the 15nm node low- voltage criteria defined by Nikonov and Young [2] and compared to other devices.
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