多壁碳纳米管阻抗

Iman Madadi, H. Aghababa, B. Forouzandeh
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引用次数: 6

摘要

在未来的技术中,人们将面临传统的铜互连问题,对单壁碳纳米管(SWCNT)和多壁碳纳米管(MWCNT)有着广泛的需求。碳纳米管的阻抗是碳纳米管互连中最重要的部分之一。因此,我们研究了不同几何形状的低偏置电压和高偏置电压下多壁碳纳米管互连的阻抗,特别是直流电阻。然后计算了MWCNT的总直流电阻,得到了一个方程。我们还研究了MWCNTs在高偏置和低阻尼模式下的行为。延迟和功率的结果表明,MWCNT的互连性能优于Cu的互连
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Multi-walled carbon nanotube impedance
In future technologies, people will confront with traditional Cu interconnect problems and there is a widespread demand for single-walled carbon nanotube (SWCNT) and multi-walled carbon nanotube (MWCNT). One of the most important parts in carbon nanotube interconnects is their impedance. Thus we investigate impedance, especially dc resistance, in multi walled carbon nano tube interconnect in low and high bias voltages for different geometries. The total dc resistance of an MWCNT is then calculated and an equation was obtained. We have also investigated the behavior of MWCNTs, in both low and high damping modes, in high bias regime. The results for delay and power showed better performance for MWCNT's interconnect compared to those for Cu's
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