Si上ingaas - msm光电探测器的性能

H. Wehmann, A. Bartels, R. Klockenbrink, G.-P. Tang, E. Peiner, A. Schlachetzki, L. Malacký
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引用次数: 0

摘要

本文描述了利用金属-有机气相外延(MOVPE)技术在[001]Si衬底上制备晶格错配InGaAs金属-半导体-金属(MSM)光电探测器。将其特性与InP上的点阵匹配器件以及文献数据进行了比较。我们发现,Si和InP探测器性能的主要差异与上述缺陷无关,而是与Si掺入生长层相关的背景掺杂浓度增加有关。
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Properties of InGaAs-MSM-photodetectors on Si
In this contribution the fabrication of lattice-mismatched InGaAs metalsemiconductor-metal (MSM) photodetectors on [001]Si substrates by metal-organic vapour-phase epitaxy (MOVPE) is described. Their characteristics are compared to lattice-matched devices on InP as well as to literature data. We found that the main differences of the detector performances on Si and InP are not related with the above mentioned defects but with an increased background doping concentration associated with the incorporation of Si into the growing layers.
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