基于电荷的CMOS电路随机老化分析

Theodor Hillebrand, Nico Hellwege, N. Heidmann, S. Paul, D. Peters-Drolshagen
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引用次数: 5

摘要

缩小的CMOS晶体管容易退化和工艺变化。这就需要一个晶体管模型来深入了解这两个关键效应之间的内在依赖关系。现代晶体管的模型和它们的退化行为几乎是不可接近的。本文提出了一个改进的BSIM6模型,该模型考虑了BTI和HCI的退化以及过程变化。以单MOSFET和逆变级为例,说明了该方法的应用。其结果可用于gm/Id工作流程或用于电路级的良率估计。
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Charge-based stochastic aging analysis of CMOS circuits
Scaled down CMOS transistors are prone to degradation and process variation. This necessitates a transistor model that provides an insight into the internal dependencies between these two crucial effects. Models for modern transistors and their degradation behavior are hardly attachable. This paper proposes a modified BSIM6 model which includes degradation due to BTI and HCI and in addition process variations. The application of this method is demonstrated on the basis of a single MOSFET and an inverter stage. The results can be used in the gm/Id work flow or for yield estimation on circuit level.
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