CMOS浮栅缺陷分析

V. Champac, A. Rubio, J. Figueras
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引用次数: 12

摘要

利用浮栅中的耦合电容和栅极中的电荷对浮栅晶体管进行了建模。开路道中开路的位置影响多体电容和金属-聚电容的值,而多体电容和金属-聚电容的值决定了缺陷晶体管的导通程度。用解析表达式估计了浮栅的感应电压和静态电流。在缺陷电路上进行的简单解析表达式、模拟(SPICE)和实验测量结果之间有很好的一致性。结果表明,浮栅晶体管不是卡开晶体管,静态电流消耗可能存在显著值。
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Analysis of the floating gate defect in CMOS
The floating gate transistor is modeled using the coupling capacitances in the floating gate and the charge in the transistor gate. The location of the open in the open track influences the value of the poly-bulk and metal-poly capacitances who determines the degree of conduction of the defective transistor. The induced voltage in the floating gate and the quiescent current are estimated by means of analytical expressions. A good agreement is observed between the simple analytical expressions, simulations (SPICE) and experimental measures performed on defective circuits. It is shown that a floating gate transistor is not a stuck-open transistor and that significative values of quiescent current consumption may exist.
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