{"title":"用于设施状态监测、检测和诊断的统一框架","authors":"Huei-Shyang You, Tzu-Chi Wang, Wen-Yao Chang, Chih-Wei Lai, Ming-Wei Lee, Kei-wei Zuo","doi":"10.1109/SMTW.2004.1393712","DOIUrl":null,"url":null,"abstract":"The advanced facility monitoring and diagnosis system provide a comprehensive solution to most of the possible problems in manufacturing. This article proposes an advanced facility monitoring and diagnosis system framework - APCSuite-ECMXpert, which consists of equipment condition monitoring system (ECMS), and advanced process control toolkit - APCSuite. The methodologies applied on facility condition monitoring and the application cases for monitoring the facility equipments in semiconductor plant are illustrated in This work.","PeriodicalId":369092,"journal":{"name":"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Unified framework for facility condition monitoring, detection, and diagnostics\",\"authors\":\"Huei-Shyang You, Tzu-Chi Wang, Wen-Yao Chang, Chih-Wei Lai, Ming-Wei Lee, Kei-wei Zuo\",\"doi\":\"10.1109/SMTW.2004.1393712\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The advanced facility monitoring and diagnosis system provide a comprehensive solution to most of the possible problems in manufacturing. This article proposes an advanced facility monitoring and diagnosis system framework - APCSuite-ECMXpert, which consists of equipment condition monitoring system (ECMS), and advanced process control toolkit - APCSuite. The methodologies applied on facility condition monitoring and the application cases for monitoring the facility equipments in semiconductor plant are illustrated in This work.\",\"PeriodicalId\":369092,\"journal\":{\"name\":\"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)\",\"volume\":\"8 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-09-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMTW.2004.1393712\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMTW.2004.1393712","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Unified framework for facility condition monitoring, detection, and diagnostics
The advanced facility monitoring and diagnosis system provide a comprehensive solution to most of the possible problems in manufacturing. This article proposes an advanced facility monitoring and diagnosis system framework - APCSuite-ECMXpert, which consists of equipment condition monitoring system (ECMS), and advanced process control toolkit - APCSuite. The methodologies applied on facility condition monitoring and the application cases for monitoring the facility equipments in semiconductor plant are illustrated in This work.