用于设施状态监测、检测和诊断的统一框架

Huei-Shyang You, Tzu-Chi Wang, Wen-Yao Chang, Chih-Wei Lai, Ming-Wei Lee, Kei-wei Zuo
{"title":"用于设施状态监测、检测和诊断的统一框架","authors":"Huei-Shyang You, Tzu-Chi Wang, Wen-Yao Chang, Chih-Wei Lai, Ming-Wei Lee, Kei-wei Zuo","doi":"10.1109/SMTW.2004.1393712","DOIUrl":null,"url":null,"abstract":"The advanced facility monitoring and diagnosis system provide a comprehensive solution to most of the possible problems in manufacturing. This article proposes an advanced facility monitoring and diagnosis system framework - APCSuite-ECMXpert, which consists of equipment condition monitoring system (ECMS), and advanced process control toolkit - APCSuite. The methodologies applied on facility condition monitoring and the application cases for monitoring the facility equipments in semiconductor plant are illustrated in This work.","PeriodicalId":369092,"journal":{"name":"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2004-09-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Unified framework for facility condition monitoring, detection, and diagnostics\",\"authors\":\"Huei-Shyang You, Tzu-Chi Wang, Wen-Yao Chang, Chih-Wei Lai, Ming-Wei Lee, Kei-wei Zuo\",\"doi\":\"10.1109/SMTW.2004.1393712\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The advanced facility monitoring and diagnosis system provide a comprehensive solution to most of the possible problems in manufacturing. This article proposes an advanced facility monitoring and diagnosis system framework - APCSuite-ECMXpert, which consists of equipment condition monitoring system (ECMS), and advanced process control toolkit - APCSuite. The methodologies applied on facility condition monitoring and the application cases for monitoring the facility equipments in semiconductor plant are illustrated in This work.\",\"PeriodicalId\":369092,\"journal\":{\"name\":\"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)\",\"volume\":\"8 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2004-09-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMTW.2004.1393712\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2004 Semiconductor Manufacturing Technology Workshop Proceedings (IEEE Cat. No.04EX846)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMTW.2004.1393712","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

先进的设备监测和诊断系统为生产中可能出现的大多数问题提供了全面的解决方案。本文提出了一种先进的设备监测诊断系统框架——APCSuite- ecmxpert,它由设备状态监测系统(ECMS)和先进的过程控制工具箱——APCSuite组成。介绍了设备状态监测的方法及在半导体工厂设备状态监测中的应用实例。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Unified framework for facility condition monitoring, detection, and diagnostics
The advanced facility monitoring and diagnosis system provide a comprehensive solution to most of the possible problems in manufacturing. This article proposes an advanced facility monitoring and diagnosis system framework - APCSuite-ECMXpert, which consists of equipment condition monitoring system (ECMS), and advanced process control toolkit - APCSuite. The methodologies applied on facility condition monitoring and the application cases for monitoring the facility equipments in semiconductor plant are illustrated in This work.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
An e-Diagnostics framework with security considerations for semiconductor factories Feasibility of measuring four profile parameters for metal-0 trench of DRAM by spectroscopic ellipsometry based profile technology Learning software agent design for semiconductor tool group dispatching Selectivity investigation of HfO/sub 2/ to oxide using wet etching Strategy and benefit analysis of water saving in 8" semiconductor fab
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1