一种新颖的0.7 V双端口6T SRAM存储单元结构,采用部分耗尽SOI CMOS动态阈值技术,具有单比特线同时读写访问(SBLSRWA)能力

S. Liu, J. Kuo
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引用次数: 2

摘要

只提供摘要形式。本文报道了一种新颖的低压双端口6T SRAM存储单元结构,该结构采用部分耗尽SOI CMOS动态阈值技术,具有单位线同时读写访问能力。通过一种创新的方法,将锁存器中的NMOS器件的主体终端和写访问通晶体管连接到写字线,该6T存储单元可用于为0.7 V双端口SOI CMOS VLSI SRAM提供SBLSRWA能力,并经MEDICI结果验证。
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A novel 0.7 V two-port 6T SRAM memory cell structure with single-bit-line simultaneous read-and-write access (SBLSRWA) capability using partially-depleted SOI CMOS dynamic-threshold technique
Summary form only given. This paper reports a novel low-voltage two-port 6T SRAM memory cell structure with single-bit-line simultaneous read-and-write access capability using a partially-depleted SOI CMOS dynamic-threshold technique. With an innovative approach connecting the body terminal of an NMOS device in the latch and the write access pass transistor to the write word line, this 6T memory cell can be used to provide SBLSRWA capability for 0.7 V two-port SOI CMOS VLSI SRAM, as verified by MEDICI results.
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A novel 0.7 V two-port 6T SRAM memory cell structure with single-bit-line simultaneous read-and-write access (SBLSRWA) capability using partially-depleted SOI CMOS dynamic-threshold technique Power amplifiers on thin-film-silicon-on-insulator (TFSOI) technology Single chip wireless systems using SOI Buried oxide fringing capacitance: a new physical model and its implication on SOI device scaling and architecture A bandgap circuit operating up to 300/spl deg/C using lateral bipolar transistors in thin-film CMOS-SOI technology
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