n型轻掺铁InP晶圆热退火后的半绝缘性能

R. Fornari, A. Zappettini, E. Gombia, R. Mosca, M. Curti, K. Chearkaoui, G. Manakchi
{"title":"n型轻掺铁InP晶圆热退火后的半绝缘性能","authors":"R. Fornari, A. Zappettini, E. Gombia, R. Mosca, M. Curti, K. Chearkaoui, G. Manakchi","doi":"10.1109/ICIPRM.1996.492036","DOIUrl":null,"url":null,"abstract":"As-grown Fe-doped semiconducting (SC) InP samples (residual carrier concentration /spl les/10/sup 15/ cm/sup -3/, estimated iron concentration 6-8/spl times/10/sup 15/ cm/sup -3/) were seen to convert to semi-insulating (SI), with high resistivity and good mobility, when annealed under appropriate conditions. This fact is very interesting since it gives the opportunity of obtaining semi-insulating InP with low Fe content. In this paper we report the annealing parameters together with the results of an extensive characterization (by Hall effect, C-V, IR absorption and PICTS) of the treated samples. The results suggest that the conductivity drop is related to a considerable loss of shallow donors.","PeriodicalId":268278,"journal":{"name":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","volume":"04 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1996-04-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Semi-insulating behaviour of n-type lightly Fe-doped InP wafers after thermal annealing\",\"authors\":\"R. Fornari, A. Zappettini, E. Gombia, R. Mosca, M. Curti, K. Chearkaoui, G. Manakchi\",\"doi\":\"10.1109/ICIPRM.1996.492036\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"As-grown Fe-doped semiconducting (SC) InP samples (residual carrier concentration /spl les/10/sup 15/ cm/sup -3/, estimated iron concentration 6-8/spl times/10/sup 15/ cm/sup -3/) were seen to convert to semi-insulating (SI), with high resistivity and good mobility, when annealed under appropriate conditions. This fact is very interesting since it gives the opportunity of obtaining semi-insulating InP with low Fe content. In this paper we report the annealing parameters together with the results of an extensive characterization (by Hall effect, C-V, IR absorption and PICTS) of the treated samples. The results suggest that the conductivity drop is related to a considerable loss of shallow donors.\",\"PeriodicalId\":268278,\"journal\":{\"name\":\"Proceedings of 8th International Conference on Indium Phosphide and Related Materials\",\"volume\":\"04 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1996-04-21\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings of 8th International Conference on Indium Phosphide and Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1996.492036\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of 8th International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1996.492036","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

生长的掺铁半导体(SC) InP样品(残余载流子浓度/spl次/10/sup 15/ cm/sup -3/,估计铁浓度6-8/spl次/10/sup 15/ cm/sup -3/)在适当条件下退火后转化为半绝缘(SI),具有高电阻率和良好的迁移率。这一事实非常有趣,因为它提供了获得低铁含量半绝缘InP的机会。在本文中,我们报告了退火参数以及处理样品的广泛表征(通过霍尔效应,C-V,红外吸收和PICTS)的结果。结果表明,电导率的下降与浅层供体的大量损失有关。
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Semi-insulating behaviour of n-type lightly Fe-doped InP wafers after thermal annealing
As-grown Fe-doped semiconducting (SC) InP samples (residual carrier concentration /spl les/10/sup 15/ cm/sup -3/, estimated iron concentration 6-8/spl times/10/sup 15/ cm/sup -3/) were seen to convert to semi-insulating (SI), with high resistivity and good mobility, when annealed under appropriate conditions. This fact is very interesting since it gives the opportunity of obtaining semi-insulating InP with low Fe content. In this paper we report the annealing parameters together with the results of an extensive characterization (by Hall effect, C-V, IR absorption and PICTS) of the treated samples. The results suggest that the conductivity drop is related to a considerable loss of shallow donors.
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