门控GaAs/AlGaAs调制掺杂量子阱中复合速率的密度依赖性

G. Peter, R. Fischer, E. Göbel, H. Liu, C. Delalande, G. Bastard, M. Voos, J. Brum, G. Weimann, W. Schlapp
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引用次数: 0

摘要

近年来,调制掺杂量子阱(MDQW)的物理性质从器件和基础物理的角度引起了人们的广泛关注。利用这些结构可以实现降维的简并单组分和多组分费米系统,并且可以用光谱学的方法研究许多体效应。本文报道了载流子密度与复合动力学关系的实验研究。在低温(T = 4K)条件下,利用皮秒光致发光(PL)技术研究了一个13 nm宽的n型单MDQW。垂直于量子阱层的外部电压可以通过肖特基接触(蒸发在样品表面)施加,以便在ns = 0到约3•1011 cm-2之间改变量子阱中的电子浓度(详情见参考文献/2,5,6/)。因此,我们可以覆盖激子复合发生的状态,直到光学性质由单组分自由载流子等离子体控制的密度。因此,我们避免了比较不同样品的关键缺点,其中样品与样品的井宽,界面质量,PL效率等变化使物理解释复杂化。
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Density dependence of recombination rates in a gated GaAs/AlGaAs modulation doped quantum well
During the last years the physical properties of modulation doped quantum wells (MDQW) have attracted much attention from both a device as well as from a fundamental physics point of view. With these structures a degenerate one and more component Fermi system of reduced dimensionality can be realized, and e. g. many body effects can be investigated by means of optical spectroscopy /1-4/. In this paper we report on experimental studies of the carrier density dependence of the recombination dynamics. We have investigated a 13 nm wide n-type single MDQW by means of picosecond photoluminescence (PL) spectroscopy at low temperature (T = 4K). An external voltage perpendicular to the quantum well layer can be applied via a Schottky contact (evaporated on the surface of the sample) in order to vary the electron concentration in the quantum well between ns = 0 up to about 3 • 1011 cm-2 (details are reported in ref. /2,5,6/). Consequently, we can cover the regime where excitonic recombination takes place up to densities where the optical properties are governed by a one component free carrier plasma. We thereby have avoided the crucial disadvantage of comparing different samples, where the sample to sample variations of well width, interface quality, PL efficiency etc. complicate the physical interpretation.
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