浮门记忆细胞的重离子辐照

G. Cellere, A. Paccagnella, P. Caprara, A. Visconti
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引用次数: 0

摘要

我们展示了Ag和I离子辐照EPROM和Flash器件的结果。位翻转很少在FG存储器中观察到,因为控制电路远比存储器阵列本身更辐射敏感。然而,我们已经证明,在重离子照射后,细胞可能会经历较大的阈值电压变化。漏极电流或阈值电压漂移在整个器件中随机分布。特别是,重离子冲击后检测到的电荷损失太大,现有模型无法描述。未来工作的目标是扩展对编程FG中电荷损失的物理机制的理解。
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Heavy ion irradiation of floating gate memory cells
We have shown results on irradiation of EPROM and Flash devices with Ag and I ions. Bit flip are seldom observed in FG memories, because the control circuitry is by far more radiation sensitive than the memory array itself. Nevertheless, we have shown that, after heavy ions irradiation, cells may experience large threshold voltage shifts. Drain current or threshold voltage shifts are randomly distributed across the device. In particular, charge loss detected after a heavy ion stroke a FG is too large to be described by existing models. The aim of future work is to extend the understanding of the physical mechanism underlying charge loss from the programmed FG.
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